Elionix ELS-7500EX E-Beam Lithography System

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Elionix ELS-7500EX E-Beam Lithography System
EBL-01.jpeg
Tool Name Elionix ELS-7500EX E-Beam Lithography System
Instrument Type Lithography
Staff Manager David Barth
Lab Location Bay 4
Tool Manufacturer Elionix
Tool Model ELS-7500EX
NEMO Designation {{{NEMO_Designation}}}
Nearest Phone 8-9799
SOP Link SOP

Description

The Elionix ELS-7500EX is an electron beam lithography tool capable of high resolution patterning at 50 kV with currents from 10 pA to 20 nA.

Applications
  • Patterning of positive and negative e-beam resists with features from ~10 nm to micron scale
Allowed Materials
  • Standard semiconductor materials
  • Low vapor pressure metals
  • Resists

Resources

SOPs & Troubleshooting
Retrieved from "https://wiki.nano.upenn.edu/wiki/index.php?title=Elionix_ELS-7500EX_E-Beam_Lithography_System&oldid=162"