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- 14:24, 16 September 2024 diff hist -6 PECVD SiNx via CHF3 + O2 →Goal
- 14:23, 16 September 2024 diff hist +76 PECVD SiNx via CHF3 + O2
- 14:20, 16 September 2024 diff hist 0 Oxford 80 Plus RIE
- 13:59, 16 September 2024 diff hist -15 PECVD SiO2 via CHF3 + O2 current
- 13:59, 16 September 2024 diff hist +170 PECVD SiNx via CHF3 + O2
- 13:56, 16 September 2024 diff hist 0 N File:SiO2 etch via DE04 CHF3 O2.png current
- 13:53, 16 September 2024 diff hist +1,459 PECVD SiNx via CHF3 + O2
- 13:49, 16 September 2024 diff hist +5 PECVD SiO2 via CHF3 + O2
- 13:48, 16 September 2024 diff hist +60 N PECVD SiNx via CHF3 + O2 Created page with "== Results == center|800px"
- 13:48, 16 September 2024 diff hist 0 Oxford 80 Plus RIE →Standard Process Information
- 13:48, 16 September 2024 diff hist +24 Oxford 80 Plus RIE →Standard Process Information
- 13:47, 16 September 2024 diff hist -60 PECVD SiNx via CF4 Blanked the page current Tag: Blanking
- 13:47, 16 September 2024 diff hist 0 PECVD SiNx via CF4 →Results
- 13:46, 16 September 2024 diff hist +60 N PECVD SiNx via CF4 Created page with "== Results == center|800px"
- 13:44, 16 September 2024 diff hist 0 File:SiN etch on DE-04.png Azadi uploaded a new version of File:SiN etch on DE-04.png current
- 13:38, 16 September 2024 diff hist +37 N File:SiN etch on DE-04.png SiN etch on DE04 CHF3O2
- 12:13, 16 September 2024 diff hist 0 Oxford 80 Plus RIE →Etch Rate
- 12:12, 16 September 2024 diff hist -723 Oxford 80 Plus RIE →Standard Process Information
- 13:33, 30 July 2024 diff hist +40 N File:RIE CF4 etch rate 2min SiN LPCVD 07292024.png LPCVD SiNx with CF4 in RIE current
- 13:28, 30 July 2024 diff hist 0 Oxford 80 Plus RIE →Standard Process Information
- 12:08, 30 July 2024 diff hist +4 Oxford 80 Plus RIE →The following materials are not allowed in the chamber
- 13:13, 29 July 2024 diff hist 0 Oxford PlasmaLab 100 PECVD
- 08:59, 18 June 2024 diff hist -61 PECVD SiO2 via CHF3 + O2 →Results
- 08:59, 18 June 2024 diff hist +62 PECVD SiO2 via CHF3 + O2
- 08:52, 18 June 2024 diff hist 0 PECVD SiO2 via CHF3 + O2 →Results
- 08:47, 18 June 2024 diff hist -14 PECVD SiO2 via CHF3 + O2 →Results
- 08:47, 18 June 2024 diff hist +10 PECVD SiO2 via CHF3 + O2 →Results
- 08:46, 18 June 2024 diff hist -9 PECVD SiO2 via CHF3 + O2 →Results
- 08:46, 18 June 2024 diff hist -31 PECVD SiO2 via CHF3 + O2 →Results
- 08:45, 18 June 2024 diff hist +30 PECVD SiO2 via CHF3 + O2 →Results
- 08:45, 18 June 2024 diff hist +61 N File:DE04 PECVD SiO2 rate etch via CHF3O2.png DE04 etch rate for PECVD SiO2 using CHF3 and O2 current
- 08:44, 18 June 2024 diff hist -30 PECVD SiO2 via CHF3 + O2 →Results
- 08:44, 18 June 2024 diff hist +33 PECVD SiO2 via CHF3 + O2 →Results
- 08:43, 18 June 2024 diff hist +93 PECVD SiO2 via CHF3 + O2
- 08:37, 18 June 2024 diff hist -1 PECVD SiO2 via CHF3 + O2 →Expose
- 08:37, 18 June 2024 diff hist +3 PECVD SiO2 via CHF3 + O2 →Expose
- 08:37, 18 June 2024 diff hist -1 PECVD SiO2 via CHF3 + O2 →Soft Bake
- 08:31, 18 June 2024 diff hist -1,433 PECVD SiO2 via CF4 Blanked the page current Tag: Blanking
- 08:30, 18 June 2024 diff hist +1,433 N PECVD SiO2 via CHF3 + O2 Created page with "== Goal == The purpose of this document is to examine the etch properties of the Oxford 80 Plus RIE system and to find the etch rate of SiO2 and S1818 MicroChem positive resi..."
- 08:30, 18 June 2024 diff hist +25 Oxford 80 Plus RIE →Standard Process Information
- 08:17, 18 June 2024 diff hist -1 Oxford 80 Plus RIE →Etch Rate
- 08:17, 18 June 2024 diff hist -18 Oxford 80 Plus RIE →Etch Rate
- 08:16, 18 June 2024 diff hist -5 Oxford 80 Plus RIE →Etch Rate
- 08:16, 18 June 2024 diff hist +6 Oxford 80 Plus RIE →Etch Rate
- 08:14, 18 June 2024 diff hist +18 Oxford 80 Plus RIE →Standard Process Information
- 08:12, 18 June 2024 diff hist -4 Oxford 80 Plus RIE
- 08:12, 18 June 2024 diff hist +4 Oxford 80 Plus RIE →Standard Process Information
- 08:10, 18 June 2024 diff hist -5 PECVD SiO2 via CF4 →Etch
- 08:10, 18 June 2024 diff hist -2 PECVD SiO2 via CF4 →Etch
- 08:10, 18 June 2024 diff hist -1 PECVD SiO2 via CF4 →Etch
