Difference between revisions of "Nanoscribe Photonic Professional GT"
(updated materials, configurations information) |
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'' '''Upgraded to GT+ in Dec 2024!''' Includes new housing with easier objective loading with 10x objective capability and greater print height (previously 3mm) '' | '' '''Upgraded to GT+ in Dec 2024!''' Includes new housing with easier objective loading with 10x objective capability and greater print height (previously 3mm) '' | ||
| − | ==== | + | ====Tool Features==== |
* Laser Power: 50-150mW | * Laser Power: 50-150mW | ||
* Print Height: Up to 8mm | * Print Height: Up to 8mm | ||
| Line 27: | Line 27: | ||
* Lateral resolution ~ 200 nm | * Lateral resolution ~ 200 nm | ||
* Vertical resolution ~ 300 nm | * Vertical resolution ~ 300 nm | ||
| − | * Piezo scanning range: 300 x 300 x 300 | + | * Piezo scanning range: 300 x 300 x 300 μm<sup>3</sup> |
| − | * Stage scanning range: 100 x 100 | + | * Stage scanning range: 100 x 100 mm<sup>2</sup> |
| + | ====Available Print Sets==== | ||
{| class="wikitable" style="vertical-align:bottom;" | {| class="wikitable" style="vertical-align:bottom;" | ||
|- | |- | ||
! Objective | ! Objective | ||
| − | + | ! Voxel size (width) | |
| − | ! Voxel size | + | ! Print field radius |
| − | ! Print field ( | + | ! Print time (per mm<sup>3</sup>) |
| + | ! Resins | ||
| + | ! Substrates | ||
|- | |- | ||
| 63x | | 63x | ||
| − | | | + | | ~0.2 μm |
| − | | ~ | + | | 100 μm |
| − | | | + | | ~2.5 hr |
| + | | IP-Dip, IP-PDMS, IP-L | ||
| + | | Fused Silica Glass, ITO/Soda Lime Glass, Silicon | ||
|- | |- | ||
| 25x | | 25x | ||
| − | | | + | | ~0.6 μm |
| − | | ~ | + | | 200 μm |
| − | | | + | | ~1.25 hr |
| + | | IP-S, IP-PDMS, IP-L, IP-Visio | ||
| + | | ITO/Soda Lime Glass, Silicon | ||
|- | |- | ||
| 10x | | 10x | ||
| − | | IP-Q | + | | ~1.2 μm |
| − | | | + | | 500 μm |
| − | + | | ~10 min | |
| + | | IP-Q, IP-PDMS | ||
| + | | Silicon | ||
|} | |} | ||
| Line 56: | Line 65: | ||
'''Print field =''' the circular region an objective could write without moving the stage. Structures that exceed the print field of the objective must be split into blocks in Describe. | '''Print field =''' the circular region an objective could write without moving the stage. Structures that exceed the print field of the objective must be split into blocks in Describe. | ||
| + | |||
| + | '''Print time=''' how long to take to print a 10 μm cube (1 mm<sup>3</sup>). The print times for the 25x and 10x are calculated for shell recipes. Solid recipes would take longer to print the same volume. | ||
== Allowed Materials == | == Allowed Materials == | ||
| + | |||
'''Substrates''' | '''Substrates''' | ||
* 4" Si wafers (~500um thickness) | * 4" Si wafers (~500um thickness) | ||
* Silicon pieces, 25mmx25mmx700um or 25mmx25mmx550um | * Silicon pieces, 25mmx25mmx700um or 25mmx25mmx550um | ||
| − | * Nanoscribe ITO-coated Soda Lime, 25mmx25mmx700um -- available in the [https://nemo.nano.upenn.edu/stockroom/ QNF Stockroom] | + | * Nanoscribe ITO-coated Soda Lime Glass, 25mmx25mmx700um -- available in the [https://nemo.nano.upenn.edu/stockroom/ QNF Stockroom] |
| − | * Nanoscribe Fused Silica, 25mmx25mmx700um -- available in the [https://nemo.nano.upenn.edu/stockroom/ QNF Stockroom] | + | * Nanoscribe Fused Silica Glass, 25mmx25mmx700um -- available in the [https://nemo.nano.upenn.edu/stockroom/ QNF Stockroom] |
| + | * Borosilicate Coverslips, 30mm x 170um -- for oil immersion configuration | ||
'''Resists''' | '''Resists''' | ||
| − | * | + | * IP-Dip |
| − | * | + | * IP-S |
| − | * | + | * IP-Q |
| − | * [[Resists_at_QNF#QNF_Supplied_Standard_Photoresists | | + | * IP-PDMS |
| + | * IP-L | ||
| + | * IP-Visio | ||
| + | More information about these resists can be found '''[[Resists_at_QNF#QNF_Supplied_Standard_Photoresists | here]]''' | ||
'''Other materials must have tool owner approval before use!''' | '''Other materials must have tool owner approval before use!''' | ||
Revision as of 16:59, 7 November 2025
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| Tool Name | Nanoscribe Photonic Professional GT+ |
|---|---|
| Instrument Type | Lithography |
| Staff Manager | Ana Cohen |
| Lab Location | Bay 6 |
| Tool Manufacturer | Nanoscribe |
| Tool Model | Photonic Professional GT+ |
| NEMO Designation | LW-02 |
| Nearest Phone | XXXXX |
| SOP Link | SOP |
Description
The Nanoscribe Photonic Professional enables the fabrication of true 3D structures in the microscale via two-photon polymerization using a 780nm laser with ~100fs pulse, 80MHz repetition rate. This system allows for cutting-edge research and rapid prototyping in microfluidics, MEMS, microoptics, nanostructures and more.
Upgraded to GT+ in Dec 2024! Includes new housing with easier objective loading with 10x objective capability and greater print height (previously 3mm)
Tool Features
- Laser Power: 50-150mW
- Print Height: Up to 8mm
- Lateral resolution ~ 200 nm
- Vertical resolution ~ 300 nm
- Piezo scanning range: 300 x 300 x 300 μm3
- Stage scanning range: 100 x 100 mm2
Available Print Sets
| Objective | Voxel size (width) | Print field radius | Print time (per mm3) | Resins | Substrates |
|---|---|---|---|---|---|
| 63x | ~0.2 μm | 100 μm | ~2.5 hr | IP-Dip, IP-PDMS, IP-L | Fused Silica Glass, ITO/Soda Lime Glass, Silicon |
| 25x | ~0.6 μm | 200 μm | ~1.25 hr | IP-S, IP-PDMS, IP-L, IP-Visio | ITO/Soda Lime Glass, Silicon |
| 10x | ~1.2 μm | 500 μm | ~10 min | IP-Q, IP-PDMS | Silicon |
Voxel = the smallest printable 3D volume, the 3D analogue of a 2D pixel. Single voxels are not mechanically stable. Multiple neighboring voxels/lines are recommended for stable structures.
Print field = the circular region an objective could write without moving the stage. Structures that exceed the print field of the objective must be split into blocks in Describe.
Print time= how long to take to print a 10 μm cube (1 mm3). The print times for the 25x and 10x are calculated for shell recipes. Solid recipes would take longer to print the same volume.
Allowed Materials
Substrates
- 4" Si wafers (~500um thickness)
- Silicon pieces, 25mmx25mmx700um or 25mmx25mmx550um
- Nanoscribe ITO-coated Soda Lime Glass, 25mmx25mmx700um -- available in the QNF Stockroom
- Nanoscribe Fused Silica Glass, 25mmx25mmx700um -- available in the QNF Stockroom
- Borosilicate Coverslips, 30mm x 170um -- for oil immersion configuration
Resists
- IP-Dip
- IP-S
- IP-Q
- IP-PDMS
- IP-L
- IP-Visio
More information about these resists can be found here
Other materials must have tool owner approval before use!
Training Protocol
1. Remote session on EBL-02 for the Describe conversion software, using your structure (90min)
2. In-person session on LW-02 (120min)
3. Qualification session on LW-02, where you run the tool with minimal input (~60min) -- must be done after previous two sessions are completed, cannot be done the same day as the in-person training
All should be requested through NEMO.