Difference between revisions of "Nanoscribe Photonic Professional GT"
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== Training Protocol == | == Training Protocol == | ||
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'''1.''' Remote session on EBL-02 for the Describe conversion software, using your structure (90min) <br> | '''1.''' Remote session on EBL-02 for the Describe conversion software, using your structure (90min) <br> | ||
'''2.''' In-person session on LW-02 (120min) <br> | '''2.''' In-person session on LW-02 (120min) <br> | ||
'''3.''' Qualification session on LW-02, where you run the tool with minimal input (~60min) -- must be done after previous two sessions are completed, cannot be done the same day as the in-person training | '''3.''' Qualification session on LW-02, where you run the tool with minimal input (~60min) -- must be done after previous two sessions are completed, cannot be done the same day as the in-person training | ||
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| + | ''All should be requested through [https://nemo.nano.upenn.edu/training/ NEMO].'' | ||
== Resources == | == Resources == | ||
Revision as of 11:29, 3 November 2025
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| Tool Name | Nanoscribe Photonic Professional GT+ |
|---|---|
| Instrument Type | Lithography |
| Staff Manager | Ana Cohen |
| Lab Location | Bay 6 |
| Tool Manufacturer | Nanoscribe |
| Tool Model | Photonic Professional GT+ |
| NEMO Designation | LW-02 |
| Nearest Phone | XXXXX |
| SOP Link | SOP |
Description
The Nanoscribe Photonic Professional enables the fabrication of true 3D structures in the microscale via two-photon polymerization using a 780nm laser with ~100fs pulse, 80MHz repetition rate. This system allows for cutting-edge research and rapid prototyping in microfluidics, MEMS, microoptics, nanostructures and more.
Upgraded to GT+ in Dec 2024! Includes new housing with easier objective loading with 10x objective capability and greater print height (previously 3mm)
Key Features
- Laser Power: 50-150mW
- Print Height: Up to 8mm
- Lateral resolution ~ 200 nm
- Vertical resolution ~ 300 nm
- Piezo scanning range: 300 x 300 x 300 μm3
- Stage scanning range: 100 x 100 mm2
Objectives
- 10x
- 20x
- 25x
- 63x
Allowed Materials
Substrates
- 4" Si wafers (~500um thickness)
- Silicon pieces, 25mmx25mmx700um or 25mmx25mmx550um
- Nanoscribe ITO-coated Soda Lime, 25mmx25mmx700um -- available in the QNF Stockroom
- Nanoscribe Fused Silica, 25mmx25mmx700um -- available in the QNF Stockroom
Resists
Other materials must have tool owner approval before use!
Training Protocol
1. Remote session on EBL-02 for the Describe conversion software, using your structure (90min)
2. In-person session on LW-02 (120min)
3. Qualification session on LW-02, where you run the tool with minimal input (~60min) -- must be done after previous two sessions are completed, cannot be done the same day as the in-person training
All should be requested through NEMO.