Difference between revisions of "Nanoscribe Photonic Professional GT"
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'' '''Upgraded to GT+ in Dec 2024!''' Includes new housing with easier objective loading with 10x objective capability and greater print height (previously 3mm) '' | '' '''Upgraded to GT+ in Dec 2024!''' Includes new housing with easier objective loading with 10x objective capability and greater print height (previously 3mm) '' | ||
| − | + | ====Key Features==== | |
* Laser Power: 50-150mW | * Laser Power: 50-150mW | ||
* Print Height: Up to 8mm | * Print Height: Up to 8mm | ||
| + | |||
* Lateral resolution ~ 200 nm | * Lateral resolution ~ 200 nm | ||
* Vertical resolution ~ 300 nm | * Vertical resolution ~ 300 nm | ||
* Piezo scanning range: 300 x 300 x 300 μm3 | * Piezo scanning range: 300 x 300 x 300 μm3 | ||
* Stage scanning range: 100 x 100 mm2 | * Stage scanning range: 100 x 100 mm2 | ||
| + | |||
| + | ====Objectives==== | ||
| + | * 10x | ||
| + | * 20x | ||
| + | * 25x | ||
| + | * 63x | ||
| + | |||
| + | == Allowed Materials == | ||
| + | '''Substrates''' | ||
| + | * 4" Si wafers (~500um thickness) | ||
| + | * Silicon pieces, 25mmx25mmx700um or 25mmx25mmx550um | ||
| + | * Nanoscribe ITO-coated Soda Lime, 25mmx25mmx700um -- available in the [https://nemo.nano.upenn.edu/stockroom/ QNF Stockroom] | ||
| + | * Nanoscribe Fused Silica, 25mmx25mmx700um -- available in the [https://nemo.nano.upenn.edu/stockroom/ QNF Stockroom] | ||
| + | '''Resists''' | ||
| + | * [[Resists_at_QNF#QNF_Supplied_Standard_Photoresists | IP-Dip]] | ||
| + | * [[Resists_at_QNF#QNF_Supplied_Standard_Photoresists | IP-S]] | ||
| + | * [[Resists_at_QNF#QNF_Supplied_Standard_Photoresists | IP-Q]] | ||
| + | * [[Resists_at_QNF#QNF_Supplied_Standard_Photoresists | IP-PDMS]] | ||
| + | |||
| + | '''Other materials must have tool owner approval before use!''' | ||
== Training Protocol == | == Training Protocol == | ||
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* [https://wiki.nano.upenn.edu/wiki/images/d/d4/LW-02_SOP.pdf QNF SOP] | * [https://wiki.nano.upenn.edu/wiki/images/d/d4/LW-02_SOP.pdf QNF SOP] | ||
* [https://support.nanoscribe.com/hc/en-gb NanoGuide] | * [https://support.nanoscribe.com/hc/en-gb NanoGuide] | ||
| − | |||
| − | |||
| − | |||
| − | |||
===== Related Processing ===== | ===== Related Processing ===== | ||
* [[Soft Lithography]] | * [[Soft Lithography]] | ||
* [[Photolithography]] | * [[Photolithography]] | ||
| + | |||
| + | ===== References ===== | ||
| + | * [https://www.nanoscribe.com/en/products/photonic-professional-gt2/ Nanoscribe GT System] | ||
| + | * [https://www.nanoscribe.com/en/products/ip-photoresins/ Nanoscribe IP Photoresins] | ||
Revision as of 11:23, 3 November 2025
 |
|
| Tool Name | Nanoscribe Photonic Professional GT+ |
|---|---|
| Instrument Type | Lithography |
| Staff Manager | Ana Cohen |
| Lab Location | Bay 6 |
| Tool Manufacturer | Nanoscribe |
| Tool Model | Photonic Professional GT+ |
| NEMO Designation | LW-02 |
| Nearest Phone | XXXXX |
| SOP Link | SOP |
Description
The Nanoscribe Photonic Professional enables the fabrication of true 3D structures in the microscale via two-photon polymerization using a 780nm laser with ~100fs pulse, 80MHz repetition rate. This system allows for cutting-edge research and rapid prototyping in microfluidics, MEMS, microoptics, nanostructures and more.
Upgraded to GT+ in Dec 2024! Includes new housing with easier objective loading with 10x objective capability and greater print height (previously 3mm)
Key Features
- Laser Power: 50-150mW
- Print Height: Up to 8mm
- Lateral resolution ~ 200 nm
- Vertical resolution ~ 300 nm
- Piezo scanning range: 300 x 300 x 300 μm3
- Stage scanning range: 100 x 100 mm2
Objectives
- 10x
- 20x
- 25x
- 63x
Allowed Materials
Substrates
- 4" Si wafers (~500um thickness)
- Silicon pieces, 25mmx25mmx700um or 25mmx25mmx550um
- Nanoscribe ITO-coated Soda Lime, 25mmx25mmx700um -- available in the QNF Stockroom
- Nanoscribe Fused Silica, 25mmx25mmx700um -- available in the QNF Stockroom
Resists
Other materials must have tool owner approval before use!
Training Protocol
1. Remote session on EBL-02 for the Describe conversion software, using your structure (90min)
2. In-person session on LW-02 (120min)
3. Qualification session on LW-02, where you run the tool with minimal input (~60min) -- must be done after previous two sessions are completed, cannot be done the same day as the in-person training