Difference between revisions of "Nanoscribe Photonic Professional GT"

**Nanoscribe Photonic Professional GT+**
Tool Name	Nanoscribe Photonic Professional GT+
Instrument Type	Lithography
Staff Manager	Ana Cohen
Lab Location	Bay 6
Tool Manufacturer	Nanoscribe
Tool Model	Photonic Professional GT+
NEMO Designation	LW-02
Nearest Phone	XXXXX
SOP Link	SOP

Revision as of 11:10, 3 November 2025

Description

The Nanoscribe Photonic Professional enables the fabrication of true 3D structures in the microscale via two-photon polymerization using a 780nm laser with ~100fs pulse, 80MHz repetition rate. This system allows for cutting-edge research and rapid prototyping in microfluidics, MEMS, microoptics, nanostructures and more.

Upgraded to GT+ in Dec 2024! Includes new housing with easier objective loading with 10x objective capability and greater print height (previously 3mm)

Key Features

Laser Power: 50-150mW
Print Height: Up to 8mm
Lateral resolution ~ 200 nm
Vertical resolution ~ 300 nm
Piezo scanning range: 300 x 300 x 300 μm3
Stage scanning range: 100 x 100 mm2

Training Protocol

1. Remote session on EBL-02 for the Describe conversion software, using your structure (90min)
2. In-person session on LW-02 (120min)
3. Qualification session on LW-02, where you run the tool with minimal input (~60min) -- must be done after previous two sessions are completed, cannot be done the same day as the in-person training

Resources

SOPs & Troubleshooting

References

Related Processing

@@ Line 2: / Line 2: @@
 {{EquipmentInfo
-| name = Nanoscribe Photonic Professional GT
+| name = Nanoscribe Photonic Professional GT+
-| Tool_Name = Nanoscribe Photonic Professional GT
+| Tool_Name = Nanoscribe Photonic Professional GT+
 | image = [[Image:LW-02.jpeg|300px]]
 | imagecaption =
@@ Line 10: / Line 10: @@
 | Lab_Location = Bay 6
 | Tool_Manufacturer = Nanoscribe
-| Tool_Model = Photonic Professional GT
+| Tool_Model = Photonic Professional GT+
 | NEMO_Designation = LW-02
 | Lab_Phone = XXXXX
@@ Line 17: / Line 17: @@
 == Description ==
-The Nanoscribe Photonic Professional is an easy-to-operate table-top laser lithography system that enables the fabrication of true three-dimensional nanostructures using commercially available photoresists. Designed for the fabrication of photonic crystal structures, the instrument is also ideal for, e.g., generating three-dimensional scaffolds for biology, micro- and nanofluidic circuitry.
+The Nanoscribe Photonic Professional enables the fabrication of true 3D structures in the microscale via two-photon polymerization using a 780nm laser with ~100fs pulse, 80MHz repetition rate. This system allows for cutting-edge research and rapid prototyping in microfluidics, MEMS, microoptics, nanostructures and more.
-===== Key Features =====
+'' '''Upgraded to GT+ in Dec 2024!''' Includes new housing with easier objective loading with 10x objective capability and greater print height (previously 3mm) ''
-* Laser power: 50-150 mW, Wavelength: 780 nm, Pulse ~100 fs, Repetition rate: 80 MHz
+=====Key Features=====
-* Available for Conventional 3D printing mode, Dip-in Liquid mode and air mode
+* Laser Power: 50-150mW
-* 3D printing with lateral resolution ~ 200 nm, vertical resolution ~ 300 nm
+* Print Height: Up to 8mm
-* High-precision Piezo scanning range: 300 x 300 x 300 μm3
+* Lateral resolution ~ 200 nm
-* Motorized XY-scanning range: 100 x 100 mm2
+* Vertical resolution ~ 300 nm
-* Maximum height: 8mm
+* Piezo scanning range: 300 x 300 x 300 μm3
+* Stage scanning range: 100 x 100 mm2
+== Training Protocol ==
+'''1.''' Remote session on EBL-02 for the Describe conversion software, using your structure (90min) <br>
+'''2.''' In-person session on LW-02 (120min) <br>
+'''3.''' Qualification session on LW-02, where you run the tool with minimal input (~60min) -- must be done after previous two sessions are completed, cannot be done the same day as the in-person training
 == Resources ==
 ===== SOPs & Troubleshooting =====
 * [https://wiki.nano.upenn.edu/wiki/images/d/d4/LW-02_SOP.pdf QNF SOP]
 * [https://support.nanoscribe.com/hc/en-gb NanoGuide]
-===== Training Protocol =====
+==== References ====
-# Remote session on EBL-02 for the Describe conversion software, using your structure (90min)
+* [https://www.nanoscribe.com/en/products/photonic-professional-gt2/ Nanoscribe GT System]
-# In-person session on LW-02 (120min)
+* [https://www.nanoscribe.com/en/products/ip-photoresins/ Nanoscribe IP Photoresins]
-# Qualification session on LW-02, where you run the tool with minimal input (~60min) -- must be done after previous two sessions are completed, cannot be done the same day as the in-person training
 ===== Related Processing =====
 * [[Soft Lithography]]
 * [[Photolithography]]