Difference between revisions of "Soft Lithography"
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=====Process Flow===== | =====Process Flow===== | ||
| − | * [https://wiki.nano.upenn.edu/wiki/images/c/cf/Microfluidics_Process_Flow.pdf Making a Master] | + | * [https://wiki.nano.upenn.edu/wiki/images/c/cf/Microfluidics_Process_Flow.pdf Making a Master - Example Process Flow] |
<pdf height="800" width="1100"> File:SOP Microfluidics.pdf</pdf> | <pdf height="800" width="1100"> File:SOP Microfluidics.pdf</pdf> | ||
Revision as of 12:55, 30 July 2025
Process Flow
Process Videos
- Spin Coating Thick Resist
- Use of MA-03, ABM Mask Aligner
- Negative Resist First Mask Alignment Mark
- Developing SU8 Resist
- Degassing PDMS
Internal Resources
- T-Topping Study Report
- HARE SQ Adhesion Study - coming soon
- QNF Soft Lithography Workshop Process Flow - SU8 3050
- Presentation for Workshop - Biological Researchers (PDF Format)
- Presentation for ESE 536 Course Module (PDF Format)
External Resources
- HARE SQ Dispensing and Handling Techniques - KemLab
- PDMS Bonding - PIE Scientific
- Microfluidics and Nanofluidics Handbook: SU-8 Photolithography and Its Impact on Microfluidics by Rodrigo Martinez-Duarte and Marc J. Madou