Difference between revisions of "QNF Equipment Owner Matrix"
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| Line 100: | Line 100: | ||
| Zygo NewView 7300 Optical Profilometer || MET-05 || Metrology || [[David_Barth | David B]] | | Zygo NewView 7300 Optical Profilometer || MET-05 || Metrology || [[David_Barth | David B]] | ||
|- | |- | ||
| − | | Woollam | + | | Woollam V-VASE Ellipsometer || MET-06 || Metrology || [[Eric_Johnston | Eric]] |
|- | |- | ||
| Jandel Multi Height Four Point Probe || MET-08 || Metrology || [[Sam Azadi | Sam]] | | Jandel Multi Height Four Point Probe || MET-08 || Metrology || [[Sam Azadi | Sam]] | ||
Revision as of 09:16, 30 March 2022
| Tool Name | Tool ID | Tool Group | Process Owner |
|---|---|---|---|
| EVG 510 Wafer Bonder | BE-01 | Backend | Eric |
| EVG 620 Wafer Bond Aligner | BE-02 | Backend | Eric |
| K&S Wire Bonder | BE-03 | Backend | Eric |
| ADT 7100 Dicing Saw | BE-04 | Backend | David J |
| MPT Corp. RTP-600S Rapid Thermal Annealer | BE-05 | Backend | David B |
| Tousimis Critical Point Dryer | CPD-01 | Backend | David J |
| Dimatix ink-Jet Printer | INK-01 | Backend | TBA |
| Cambridge Nanotech S200 ALD | ALD-01 | Deposition | Sam |
| Ultratech Fiji G2 ALD | ALD-02 | Deposition | Faculty Managed |
| Veeco Savannah 200 | ALD-03 | Deposition | Sam |
| Oxford PlasmaLab 100 PECVD | CVD-01 | Deposition | Sam |
| MRL Wet/Dry Thermal Oxide | CVD-02 A | Deposition | Sam |
| MRL LPCVD Silicon Nitride | CVD-02 B | Deposition | Sam |
| MRL Anneal 1 | CVD-02 C | Deposition | Sam |
| MRL Anneal 2 | CVD-02 D | Deposition | Sam |
| SMI MOCVD, Horizontal Reactor | CVD-04 H | Deposition | Faculty Managed |
| SMI MOCVD, Vertical Reactor | CVD-04 V | Deposition | Faculty Managed |
| Lesker Nano-36 Thermal Evaporator | PVD-01 | Deposition | David B |
| Lesker PVD75 E-Beam/Thermal Evaporator | PVD-02 | Deposition | David B |
| Lesker PVD75 DC/RF Sputterer | PVD-03 | Deposition | David J |
| Lesker PVD75 E-beam Evaporator | PVD-04 | Deposition | David J |
| Denton Explorer14 Magnetron Sputterer | PVD-05 | Deposition | Sam |
| Evatec Clusterline 200 II | PVD-06 | Deposition | Faculty Managed |
| Anatech SCE-108 Barrel Asher | DE-02 | Dry Etch | Sam |
| SPTS Si DRIE | DE-03 | Dry Etch | Sam |
| Oxford 80 Plus RIE | DE-04 | Dry Etch | Sam |
| Oxford Cobra ICP Etcher | DE-05 | Dry Etch | Sam |
| SPTS/Xactix XeF2 Isotropic Etcher | DE-06 | Dry Etch | Sam |
| Jupiter II RIE Plasma Etcher | DE-08 | Dry Etch | Sam |
| Zeiss Smartzoom5 2D/3D Optical Microscope | MET-10 | Inspection | Eric |
| Zeiss Axio Imager M2m Microscope (1 of 4) | MET-12 | Inspection | David J |
| Zeiss Axio Imager M2m Microscope (2 of 4) | MET-13 | Inspection | David J |
| Zeiss Axio Imager M2m Microscope (3 of 4) | MET-14 | Inspection | David J |
| Zeiss Axio Imager M2m Microscope (4 of 4) | MET-15 | Inspection | David J |
| IPG IX-255 Excimer Laser Micromachining | LMM-01 | Laser Micromachining | Eric |
| IPG IX280-DXF Green Laser Micromachining | LMM-02 | Laser Micromachining | Eric |
| Elionix ELS-7500EX E-Beam Lithography System | EBL-01 | Lithography | David B |
| Litho Workstation for BEAMER and TRACER | EBL-02 | Lithography | David B |
| Heidelberg DWL 66+ Laser Writer | LW-01 | Lithography | David J |
| Nanoscribe Photonic Professional GT | LW-02 | Lithography | David J |
| SUSS MicroTec MA6 Gen3 Mask Aligner | MA-01 | Lithography | David J |
| Nanonex NX2600 Nanoimprint/Mask Aligner | MA-02 | Lithography | David B |
| Hawks/Genesis HMDS Vapor Prime Oven | OVN-01 | Lithography | David J |
| SUSS MicroTec AS8 AltaSpray | RC-01 | Lithography | David J |
| KLA Tencor P7 2D profilometer | MET-01 | Metrology | Sam |
| KLA Tencor P7 2D&3D/stress profilometer | MET-02 | Metrology | Sam |
| Filmetrics F50 (yellow light) | MET-03 | Metrology | Sam |
| Filmetrics F40 | MET-04 | Metrology | Sam |
| Zygo NewView 7300 Optical Profilometer | MET-05 | Metrology | David B |
| Woollam V-VASE Ellipsometer | MET-06 | Metrology | Eric |
| Jandel Multi Height Four Point Probe | MET-08 | Metrology | Sam |
| Micromanipulator 4060 Probe Station | MET-09 | Metrology | TBA |
| Filmetrics F50 (white light) | MET-11 | Metrology | Sam |
| Anatech SCE-106 Barrel Asher | DE-07 | Soft Lithography | Sam |
| ABM3000HR Mask Aligner | MA-03 | Soft Lithography | Eric |
| SCS PDS2010 Parylene Coater | PVD-07 | Soft Lithography | Kyle |
| Silanization Dessicator | PVD-08 | Soft Lithography | Eric |
| Spinner - SU-8/PDMS | SPN-07 | Soft Lithography | Eric |
| Spinner - Positive Resist (Left) - 4" Wafer Only | SPN-01 | Spinners | David J |
| Spinner - Positive Resist (Right) - Small Piece Only | SPN-03 | Spinners | David J |
| Spinner - Negative Resist (Left) | SPN-04 | Spinners | David J |
| Spinner - Negative Resist (Right) | SPN-05 | Spinners | David J |
| Spinner - E-Beam Resist Only | SPN-06 | Spinners | David J |
| Spin Rinse Dryer | SRD-01 | Wet Bench | Kyle |
| Hydrofluoric (HF) Acid Process | WB-06 | Wet Bench | Eric |