Difference between revisions of "ABM Mask Aligner"
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| − | [[Category:Soft Lithography]] | + | [[Category:Lithography]][[Category:Soft Lithography]][[Category:Photolithography]][[Category:Equipment]] |
{{EquipmentInfo | {{EquipmentInfo | ||
Latest revision as of 12:31, 28 July 2025
| Tool Name | ABM Mask Aligner |
|---|---|
| Instrument Type | Lithography |
| Staff Manager | Ana Cohen |
| Lab Location | Bay 6 |
| Tool Manufacturer | ABM |
| Tool Model | |
| NEMO Designation | MA-03 |
| Nearest Phone | xxxxx |
| SOP Link | SOP |
Description
The ABM Mask Aligner is a manual and versatile mask aligner with top-side alignment and substrate capabilities from 100mm down to small pieces. Requires a 5" mask or 5" glass plate with film mask.
Applications
Tool is used primarily for SU8 exposure. It can also be used for aligning PDMS components for PDMS-to-PDMS bonding.
Exposure time = dose (mJ/cm^2) / intensity (mW/cm^2) Dose can be determined from the resist data sheet. See table below for intensities.
To obtain vertical sidewalls with a Cr glass mask, use the long pass filter (PL-360-LP) which eliminates UV emission below 350nm. Do not use with film masks. Inherent defects in film masks will be accentuated, resulting in worse results.
| mW/cm^2 | % of output | |
|---|---|---|
| NO MASK | ~10 | 100% |
| GLASS MASK | ~9 | 87.5% |
| GLASS + FILM MASK | ~7 | 68.5% |
| GLASS + LP FILTER | ~5 | 47% |
| GLASS + FILM + LP FILTER | ~4 | 37% |
More information about Soft Lithography processing can be found under Process Resources
Resources
MA-01 to MA-03 Calculator
SOPs & Troubleshooting
- SOP
- Video - Standard procedure for previous model *good overview, note slight differences*
- Video - Alignment Marks