Difference between revisions of "Nanoscribe Photonic Professional GT"
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===== SOPs & Troubleshooting ===== | ===== SOPs & Troubleshooting ===== | ||
* [https://nemo.nano.upenn.edu/media/tool_documents/lw-02-nanoscribe/LW-02_SOP_v01.pdf QNF SOP] | * [https://nemo.nano.upenn.edu/media/tool_documents/lw-02-nanoscribe/LW-02_SOP_v01.pdf QNF SOP] | ||
| + | * [https://support.nanoscribe.com/hc/en-gb NanoGuide] | ||
Revision as of 14:42, 24 July 2025
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| Tool Name | Nanoscribe Photonic Professional GT |
|---|---|
| Instrument Type | Lithography |
| Staff Manager | Ana Cohen |
| Lab Location | Bay 6 |
| Tool Manufacturer | Nanoscribe |
| Tool Model | Photonic Professional GT |
| NEMO Designation | LW-02 |
| Nearest Phone | XXXXX |
| SOP Link | SOP |
Description
The Nanoscribe Photonic Professional is an easy-to-operate table-top laser lithography system that enables the fabrication of true three-dimensional nanostructures using commercially available photoresists. Designed for the fabrication of photonic crystal structures, the instrument is also ideal for, e.g., generating three-dimensional scaffolds for biology, micro- and nanofluidic circuitry.
Key Features
- Laser power: 50-150 mW, Wavelength: 780 nm, Pulse ~100 fs, Repetition rate: 80 MHz
- Available for Conventional 3D printing mode, Dip-in Liquid mode and air mode
- 3D printing with lateral resolution ~ 200 nm, vertical resolution ~ 300 nm
- High-precision Piezo scanning range: 300 x 300 x 300 μm3
- Motorized XY-scanning range: 100 x 100 mm2