Difference between revisions of "IntlVac NanoQuest 1 IBE"
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== Standard Process Information == | == Standard Process Information == | ||
| + | |||
| + | - Etch rate of SiO2 deposited with QNF's CVD-01 at 500 V, 0 degree, 0 rotation is ~ 40 nm/min | ||
| + | - Etch rate of SiO2 deposited with QNF's CVD-01 at 300 V, 0 degree, 0 rotation is ~ 15 nm/min | ||
| + | |||
| + | ==== Process information from user community ==== | ||
- Etch rate of Al deposited with QNF's PVD-06 at 400 V, 45 degree, 15 RPM rotation is ~ 60 nm/min | - Etch rate of Al deposited with QNF's PVD-06 at 400 V, 45 degree, 15 RPM rotation is ~ 60 nm/min | ||
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- Etch rate of Pt deposited with QNF's PVD-02 at 500 V, 45 degree, 15 RPM rotation is ~ 20 nm/min | - Etch rate of Pt deposited with QNF's PVD-02 at 500 V, 45 degree, 15 RPM rotation is ~ 20 nm/min | ||
- Etch rate of LiNbO3 at 500 V, 0 degree, 10 RPM rotation is ~ 40 nm/min | - Etch rate of LiNbO3 at 500 V, 0 degree, 10 RPM rotation is ~ 40 nm/min | ||
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===== SOPs & Troubleshooting ===== | ===== SOPs & Troubleshooting ===== | ||
Revision as of 08:37, 3 October 2024
| [[]] | |
| Tool Name | IntlVac IBE |
|---|---|
| Instrument Type | Etch |
| Staff Manager | Sam Azadi |
| Lab Location | Bay 2 |
| Tool Manufacturer | IntlVac |
| Tool Model | Nanoquest 1 |
| NEMO Designation | DE-01 |
| Lab Phone | 215-898-9748 |
| SOP Link | SOP |
Description
Nanoquest 1 is an ion miller connected to Ar gas and capable of etch small mm-scale samples up to full 4" wafers. The tool is equipped with a secondary ion mass spectroscopy (SIMS) unit and is capable of etch with manual endpoint detection. The stage has a tilt motor that allows for etch angles between 0 (directly facing the beam) and 90 degrees (parallel to the beam).
The tool in QNF is connected to Ar gas and can etch samples up to 4" wafer. Available beam voltages are: 300 V, 400 V, 450 V, and 500 V
Applications
- Ion milling
Resources
manual loading/unloading operation video
Standard Process Information
- Etch rate of SiO2 deposited with QNF's CVD-01 at 500 V, 0 degree, 0 rotation is ~ 40 nm/min - Etch rate of SiO2 deposited with QNF's CVD-01 at 300 V, 0 degree, 0 rotation is ~ 15 nm/min
Process information from user community
- Etch rate of Al deposited with QNF's PVD-06 at 400 V, 45 degree, 15 RPM rotation is ~ 60 nm/min - Etch rate of Al deposited with QNF's PVD-06 at 500 V, 45 degree, 15 RPM rotation is ~ 100 nm/min - Etch rate of AlScN deposited with QNF's PVD-06 at 500 V, 45 degree, 15 RPM rotation is ~ 43 nm/min - Etch rate of Pt deposited with QNF's PVD-02 at 500 V, 45 degree, 15 RPM rotation is ~ 20 nm/min - Etch rate of LiNbO3 at 500 V, 0 degree, 10 RPM rotation is ~ 40 nm/min