Difference between revisions of "QNF Equipment Owner Matrix"

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| MPT Corp. RTP-600S Rapid Thermal Annealer || BE-05 || Backend || [[David_Barth | David B]]
 
| MPT Corp. RTP-600S Rapid Thermal Annealer || BE-05 || Backend || [[David_Barth | David B]]
 
|-
 
|-
−
| Tousimis Critical Point Dryer || CPD-01 || Backend || David J
+
| Tousimis Critical Point Dryer || CPD-01 || Backend || [[David_Jones | David J]]
 
|-
 
|-
 
| Dimatix ink-Jet Printer || INK-01 || Backend || TBA
 
| Dimatix ink-Jet Printer || INK-01 || Backend || TBA
Line 40: Line 40:
 
| Lesker PVD75 E-Beam/Thermal Evaporator || PVD-02 || Deposition || [[David_Barth | David B]]
 
| Lesker PVD75 E-Beam/Thermal Evaporator || PVD-02 || Deposition || [[David_Barth | David B]]
 
|-
 
|-
−
| Lesker PVD75 DC/RF Sputterer || PVD-03 || Deposition || David J
+
| Lesker PVD75 DC/RF Sputterer || PVD-03 || Deposition || [[David_Jones | David J]]
 
|-
 
|-
−
| Lesker PVD75 E-beam Evaporator || PVD-04 || Deposition || David J
+
| Lesker PVD75 E-beam Evaporator || PVD-04 || Deposition || [[David_Jones | David J]]
 
|-
 
|-
 
| Denton Explorer14 Magnetron Sputterer || PVD-05 || Deposition || Sam
 
| Denton Explorer14 Magnetron Sputterer || PVD-05 || Deposition || Sam
Line 62: Line 62:
 
| Zeiss Smartzoom5 2D/3D Optical Microscope || MET-10 || Inspection || [[Eric_Johnston | Eric]]
 
| Zeiss Smartzoom5 2D/3D Optical Microscope || MET-10 || Inspection || [[Eric_Johnston | Eric]]
 
|-
 
|-
−
| Zeiss Axio Imager M2m Microscope (1 of 4) || MET-12 || Inspection || David J
+
| Zeiss Axio Imager M2m Microscope (1 of 4) || MET-12 || Inspection || [[David_Jones | David J]]
 
|-
 
|-
−
| Zeiss Axio Imager M2m Microscope (2 of 4) || MET-13 || Inspection || David J
+
| Zeiss Axio Imager M2m Microscope (2 of 4) || MET-13 || Inspection || [[David_Jones | David J]]
 
|-
 
|-
−
| Zeiss Axio Imager M2m Microscope (3 of 4) || MET-14 || Inspection || David J
+
| Zeiss Axio Imager M2m Microscope (3 of 4) || MET-14 || Inspection || [[David_Jones | David J]]
 
|-
 
|-
−
| Zeiss Axio Imager M2m Microscope (4 of 4) || MET-15 || Inspection || David J
+
| Zeiss Axio Imager M2m Microscope (4 of 4) || MET-15 || Inspection || [[David_Jones | David J]]
 
|-
 
|-
 
| IPG IX-255 Excimer Laser Micromachining || LMM-01 || Laser Micromachining || [[Eric_Johnston | Eric]]
 
| IPG IX-255 Excimer Laser Micromachining || LMM-01 || Laser Micromachining || [[Eric_Johnston | Eric]]
Line 78: Line 78:
 
| Litho Workstation for BEAMER and TRACER || EBL-02 || Lithography || [[David_Barth | David B]]
 
| Litho Workstation for BEAMER and TRACER || EBL-02 || Lithography || [[David_Barth | David B]]
 
|-
 
|-
−
| Heidelberg DWL 66+ Laser Writer || LW-01 || Lithography || David J
+
| Heidelberg DWL 66+ Laser Writer || LW-01 || Lithography || [[David_Jones | David J]]
 
|-
 
|-
−
| Nanoscribe Photonic Professional GT || LW-02 || Lithography || David J
+
| Nanoscribe Photonic Professional GT || LW-02 || Lithography || [[David_Jones | David J]]
 
|-
 
|-
−
| SUSS MicroTec MA6 Gen3 Mask Aligner || MA-01 || Lithography || David J
+
| SUSS MicroTec MA6 Gen3 Mask Aligner || MA-01 || Lithography || [[David_Jones | David J]]
 
|-
 
|-
 
| Nanonex NX2600 Nanoimprint/Mask Aligner || MA-02 || Lithography || [[David_Barth | David B]]
 
| Nanonex NX2600 Nanoimprint/Mask Aligner || MA-02 || Lithography || [[David_Barth | David B]]
 
|-
 
|-
−
| Hawks/Genesis HMDS Vapor Prime Oven || OVN-01 || Lithography || David J
+
| Hawks/Genesis HMDS Vapor Prime Oven || OVN-01 || Lithography || [[David_Jones | David J]]
 
|-
 
|-
−
| SUSS MicroTec AS8 AltaSpray || RC-01 || Lithography || David J
+
| SUSS MicroTec AS8 AltaSpray || RC-01 || Lithography || [[David_Jones | David J]]
 
|-
 
|-
 
| KLA Tencor P7 2D profilometer || MET-01 || Metrology || Sam
 
| KLA Tencor P7 2D profilometer || MET-01 || Metrology || Sam
Line 118: Line 118:
 
| Spinner - SU-8/PDMS || SPN-07 || Soft Lithography || [[Eric_Johnston | Eric]]
 
| Spinner - SU-8/PDMS || SPN-07 || Soft Lithography || [[Eric_Johnston | Eric]]
 
|-
 
|-
−
| Spinner - Positive Resist (Left) - 4" Wafer Only || SPN-01 || Spinners || David J
+
| Spinner - Positive Resist (Left) - 4" Wafer Only || SPN-01 || Spinners || [[David_Jones | David J]]
 
|-
 
|-
−
| Spinner - Positive Resist (Right) - Small Piece Only || SPN-03 || Spinners || David J
+
| Spinner - Positive Resist (Right) - Small Piece Only || SPN-03 || Spinners || [[David_Jones | David J]]
 
|-
 
|-
−
| Spinner - Negative Resist (Left) || SPN-04 || Spinners || David J
+
| Spinner - Negative Resist (Left) || SPN-04 || Spinners || [[David_Jones | David J]]
 
|-
 
|-
−
| Spinner - Negative Resist (Right) || SPN-05 || Spinners || David J
+
| Spinner - Negative Resist (Right) || SPN-05 || Spinners || [[David_Jones | David J]]
 
|-
 
|-
−
| Spinner - E-Beam Resist Only || SPN-06 || Spinners || David J
+
| Spinner - E-Beam Resist Only || SPN-06 || Spinners || [[David_Jones | David J]]
 
|-
 
|-
 
| Spin Rinse Dryer || SRD-01 || Wet Bench || Kyle
 
| Spin Rinse Dryer || SRD-01 || Wet Bench || Kyle

Revision as of 15:33, 18 March 2022

Tool Name Tool ID Tool Group Process Owner
EVG 510 Wafer Bonder BE-01 Backend Eric
EVG 620 Wafer Bond Aligner BE-02 Backend Eric
K&S Wire Bonder BE-03 Backend Eric
ADT 7100 Dicing Saw BE-04 Backend David J
MPT Corp. RTP-600S Rapid Thermal Annealer BE-05 Backend David B
Tousimis Critical Point Dryer CPD-01 Backend David J
Dimatix ink-Jet Printer INK-01 Backend TBA
Cambridge Nanotech S200 ALD ALD-01 Deposition Sam
Ultratech Fiji G2 ALD ALD-02 Deposition Faculty Managed
Veeco Savannah 200 ALD-03 Deposition Sam
Oxford PlasmaLab 100 PECVD CVD-01 Deposition Sam
MRL Wet/Dry Thermal Oxide CVD-02 A Deposition Sam
MRL LPCVD Silicon Nitride CVD-02 B Deposition Sam
MRL Anneal 1 CVD-02 C Deposition Sam
MRL Anneal 2 CVD-02 D Deposition Sam
SMI MOCVD, Horizontal Reactor CVD-04 H Deposition Faculty Managed
SMI MOCVD, Vertical Reactor CVD-04 V Deposition Faculty Managed
Lesker Nano-36 Thermal Evaporator PVD-01 Deposition David B
Lesker PVD75 E-Beam/Thermal Evaporator PVD-02 Deposition David B
Lesker PVD75 DC/RF Sputterer PVD-03 Deposition David J
Lesker PVD75 E-beam Evaporator PVD-04 Deposition David J
Denton Explorer14 Magnetron Sputterer PVD-05 Deposition Sam
Evatec Clusterline 200 II PVD-06 Deposition Faculty Managed
Anatech SCE-108 Barrel Asher DE-02 Dry Etch Sam
SPTS Si DRIE DE-03 Dry Etch Sam
Oxford 80 Plus RIE DE-04 Dry Etch Sam
Oxford Cobra ICP Etcher DE-05 Dry Etch Sam
SPTS/Xactix XeF2 Isotropic Etcher DE-06 Dry Etch Sam
Jupiter II RIE Plasma Etcher DE-08 Dry Etch Sam
Zeiss Smartzoom5 2D/3D Optical Microscope MET-10 Inspection Eric
Zeiss Axio Imager M2m Microscope (1 of 4) MET-12 Inspection David J
Zeiss Axio Imager M2m Microscope (2 of 4) MET-13 Inspection David J
Zeiss Axio Imager M2m Microscope (3 of 4) MET-14 Inspection David J
Zeiss Axio Imager M2m Microscope (4 of 4) MET-15 Inspection David J
IPG IX-255 Excimer Laser Micromachining LMM-01 Laser Micromachining Eric
IPG IX280-DXF Green Laser Micromachining LMM-02 Laser Micromachining Eric
Elionix ELS-7500EX E-Beam Lithography System EBL-01 Lithography David B
Litho Workstation for BEAMER and TRACER EBL-02 Lithography David B
Heidelberg DWL 66+ Laser Writer LW-01 Lithography David J
Nanoscribe Photonic Professional GT LW-02 Lithography David J
SUSS MicroTec MA6 Gen3 Mask Aligner MA-01 Lithography David J
Nanonex NX2600 Nanoimprint/Mask Aligner MA-02 Lithography David B
Hawks/Genesis HMDS Vapor Prime Oven OVN-01 Lithography David J
SUSS MicroTec AS8 AltaSpray RC-01 Lithography David J
KLA Tencor P7 2D profilometer MET-01 Metrology Sam
KLA Tencor P7 2D&3D/stress profilometer MET-02 Metrology Sam
Filmetrics F50 (yellow light) MET-03 Metrology Sam
Filmetrics F40 MET-04 Metrology Sam
Zygo NewView 7300 Optical Profilometer MET-05 Metrology David B
Woollam VAS Ellipsometer MET-06 Metrology Eric
Jandel Multi Height Four Point Probe MET-08 Metrology Sam
Micromanipulator 4060 Probe Station MET-09 Metrology TBA
Filmetrics F50 (white light) MET-11 Metrology Sam
Anatech SCE-106 Barrel Asher DE-07 Soft Lithography Sam
ABM3000HR Mask Aligner MA-03 Soft Lithography Eric
SCS PDS2010 Parylene Coater PVD-07 Soft Lithography Kyle
Silanization Dessicator PVD-08 Soft Lithography Eric
Spinner - SU-8/PDMS SPN-07 Soft Lithography Eric
Spinner - Positive Resist (Left) - 4" Wafer Only SPN-01 Spinners David J
Spinner - Positive Resist (Right) - Small Piece Only SPN-03 Spinners David J
Spinner - Negative Resist (Left) SPN-04 Spinners David J
Spinner - Negative Resist (Right) SPN-05 Spinners David J
Spinner - E-Beam Resist Only SPN-06 Spinners David J
Spin Rinse Dryer SRD-01 Wet Bench Kyle
Hydrofluoric (HF) Acid Process WB-06 Wet Bench Eric
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