Difference between revisions of "Raith EBPG5200+ E-Beam Lithography System"

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(Update SOP location)
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| Iris_Designation = EBL-03
 
| Iris_Designation = EBL-03
 
| Lab_Phone = 8-9799
 
| Lab_Phone = 8-9799
| SOP Link = [https://repository.upenn.edu/handle/20.500.14332/59337 SOP]
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| SOP Link = [https://repository.upenn.edu/entities/publication/8cf0d00b-4111-444b-90d1-965b23691703]
 
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===== SOPs & Troubleshooting =====
 
===== SOPs & Troubleshooting =====
* [https://repository.upenn.edu/handle/20.500.14332/59337 SOP]
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* [https://repository.upenn.edu/entities/publication/8cf0d00b-4111-444b-90d1-965b23691703 SOP]
 
* [https://www.youtube.com/watch?v=SH4EAZNu7Cw Sample Loading and Pre-alignment]
 
* [https://www.youtube.com/watch?v=SH4EAZNu7Cw Sample Loading and Pre-alignment]
 
* [https://upenn.box.com/s/atymr3okn3xf20rb1kvk7ny79plojobm Graph of Spotsize vs. Current (Internal Use Only)]
 
* [https://upenn.box.com/s/atymr3okn3xf20rb1kvk7ny79plojobm Graph of Spotsize vs. Current (Internal Use Only)]

Revision as of 14:31, 20 December 2023


Raith EBPG5200+ EBL
EBL-03.jpg
Tool Name Raith EBPG5200+ EBL
Instrument Type Lithography
Staff Manager David Barth
Lab Location Bay 4
Tool Manufacturer Raith
Tool Model EBPG5200+
NEMO Designation {{{NEMO_Designation}}}
Lab Phone 8-9799
SOP Link [1]

Description

The Raith EBPG5200+ is an electron beam lithography tool capable of high resolution patterning at 100 kV. It has a 125 MHz pattern generator, a maximum current of 350 nA, and a 1 mm mainfield size. It has an automatic aperture changer, automatic and dynamic focus and stigmation, and automatic alignment. The EBPG can achieve linewidths <8nm with stitching and overlay accuracy better than 10nm.


Applications
  • Large scale, high speed patterning of positive and negative e-beam resists with features from <10 nm to micron/mm scale
Allowed Materials
  • Standard semiconductor materials
  • Low vapor pressure metals
  • Resists

Resources

SOPs & Troubleshooting
Resist and Process Data