Difference between revisions of "Resists at QNF"

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(→‎QNF Supplied Standard Photoresists: Rearranged, added chemical composition, developer and remover --- may need to be updated to reflect proper names)
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=== QNF Supplied Standard Photoresists ===
 
=== QNF Supplied Standard Photoresists ===
 +
Click on the resist name to access the datasheet.
 
{| class="wikitable sortable"
 
{| class="wikitable sortable"
−
! Resist !! Tone !! Notes !! Alternatives !! Datasheet
+
! Name (+ Datasheet) !! Tone !! Use !! Composition !! Developer !! Remover !! Alternative Resists
 
|-
 
|-
−
| S1805 || + || General || KL5305 || [https://upenn.box.com/s/1ixn9uek8d78y16x3auicmso433glmvv Datasheet]
+
| [https://amolf.nl/wp-content/uploads/2016/09/datasheets_S1800.pdf S1805] || + || General || PGMEA || MF-319 (0.24N TMAH) || MP 1165 (NMP) || KL5305
 
|-
 
|-
−
| S1813 || + || General || KL5315 || [https://upenn.box.com/s/1ixn9uek8d78y16x3auicmso433glmvv Datasheet]
+
| [https://amolf.nl/wp-content/uploads/2016/09/datasheets_S1800.pdf S1813] || + || General || PGMEA || MF-319 (0.24N TMAH) || MP 1165 (NMP) || KL5315
 
|-
 
|-
−
| S1818 || + || General || || [https://upenn.box.com/s/1ixn9uek8d78y16x3auicmso433glmvv Datasheet]
+
| [https://amolf.nl/wp-content/uploads/2016/09/datasheets_S1800.pdf S1818] || + || General || PGMEA || MF-319 (0.24N TMAH) || MP 1165 (NMP) ||
 
|-
 
|-
−
| SPR 220-3|| + || Etch|| KPRO-3, KL6003, AZ3330F || [https://upenn.box.com/s/lpd3ev35603w582la2317tkubb36ylzt Datasheet]
+
| [https://upenn.box.com/s/lpd3ev35603w582la2317tkubb36ylzt SPR 220-3] || + || Etch || Ethyl lactate, anisole, n-amyl acetate || 0.24N TMAH || MP 1165 (NMP) || KPRO-3, KL6003, AZ3330F
 
|-
 
|-
−
| SPR 220-4.5|| + || Etch|| KPRO-3, KL6003, AZ3330F || [https://upenn.box.com/s/lpd3ev35603w582la2317tkubb36ylzt Datasheet]
+
| [https://upenn.box.com/s/lpd3ev35603w582la2317tkubb36ylzt SPR 220-4.5] || + || Etch || Ethyl lactate, anisole, n-amyl acetate || 0.24N TMAH || MP 1165 (NMP) || KPRO-3, KL6003, AZ3330F
 
|-
 
|-
−
| SPR 220-7|| + || Etch|| AZ 12XT, AZ P4620 || [https://upenn.box.com/s/lpd3ev35603w582la2317tkubb36ylzt Datasheet]
+
| [https://upenn.box.com/s/lpd3ev35603w582la2317tkubb36ylzt SPR 220-7] || + || Etch || Ethyl lactate, anisole, n-amyl acetate || 0.24N TMAH or 0.26N TMAH || MP 1165 (NMP) || AZ 12XT, AZ P4620
 
|-
 
|-
−
| AZ 3330F|| + || General, Metal RIE, Plating || SPR 220-3, SPR 220-4.5, K-PRO 3, KL6003 || [https://upenn.box.com/s/xb5pfl6zbb1eynl6oyerrub0lw3xh3n7 Datasheet]
+
| [https://upenn.box.com/s/xb5pfl6zbb1eynl6oyerrub0lw3xh3n7 AZ 3330F] || + || General, Metal RIE, Plating || PGMEA || AZ300 (0.26N TMAH) or AZ400K 1:4 (metal ion/ alkaline salts) || SPR 220-3, SPR 220-4.5, K-PRO 3, KL6003
 
|-
 
|-
−
| NR7-3000P|| - || Etch, General || || [https://upenn.box.com/s/lff7qf7wq9cn1ny8bytf0e8d87ddjit0 Datasheet]
+
| [https://upenn.box.com/s/lff7qf7wq9cn1ny8bytf0e8d87ddjit0 Datasheet NR7-3000P] || - || Etch, General || Cyclohexanone || RD6 (0.24N or 0.26N TMAH) || RR4 (DMSO), Acetone ||
 
|-
 
|-
−
| APOL-LO 3202|| - || Liftoff ||  || [https://upenn.box.com/s/1nocyldqmocrqmz1gjcwry8n86m9khtu Datasheet]
+
|  [https://upenn.box.com/s/1nocyldqmocrqmz1gjcwry8n86m9khtu Datasheet APOL-LO 3202] || - || Liftoff || PGMEA || 0.26N TMAH || NMP, DMSO ||
 
|-
 
|-
−
| IP-Dip|| - || Nanoscribe|| ||  
+
| IP-Dip || - || Nanoscribe, Epoxy || Ethoxylated acrylates || PGMEA, IPA || ||  
 
|-
 
|-
−
| HARE SQ 2|| - || Epoxy || SU-8 2005 || [https://upenn.box.com/s/4ilkowm17lowx3aod1pt8fwcrf1a8wvc Datasheet]
+
| [https://upenn.box.com/s/4ilkowm17lowx3aod1pt8fwcrf1a8wvc HARE SQ 2] || - || Epoxy || Cyclopentanone, gamma butyro lactone || PGMEA || || SU-8 2005
 
|-
 
|-
−
| HARE SQ 50|| - || Epoxy || SU-8 2050 || [https://upenn.box.com/s/4ilkowm17lowx3aod1pt8fwcrf1a8wvc Datasheet]
+
| [https://upenn.box.com/s/4ilkowm17lowx3aod1pt8fwcrf1a8wvc HARE SQ 50] || - || Epoxy || Cyclopentanone, gamma butyro lactone || PGMEA || || SU-8 2050
 
|}
 
|}
  

Revision as of 13:41, 30 June 2023

The QNF provides a variety of standard resists to meet demands for most applications. Some specialty resists are also sold through the QNF Stockroom. A summary of stocked resists along with some processing information can be found in the table below. Other similar options that may be available in QNF are also listed.

QNF Supplied Standard Photoresists

Click on the resist name to access the datasheet.

Name (+ Datasheet) Tone Use Composition Developer Remover Alternative Resists
S1805 + General PGMEA MF-319 (0.24N TMAH) MP 1165 (NMP) KL5305
S1813 + General PGMEA MF-319 (0.24N TMAH) MP 1165 (NMP) KL5315
S1818 + General PGMEA MF-319 (0.24N TMAH) MP 1165 (NMP)
SPR 220-3 + Etch Ethyl lactate, anisole, n-amyl acetate 0.24N TMAH MP 1165 (NMP) KPRO-3, KL6003, AZ3330F
SPR 220-4.5 + Etch Ethyl lactate, anisole, n-amyl acetate 0.24N TMAH MP 1165 (NMP) KPRO-3, KL6003, AZ3330F
SPR 220-7 + Etch Ethyl lactate, anisole, n-amyl acetate 0.24N TMAH or 0.26N TMAH MP 1165 (NMP) AZ 12XT, AZ P4620
AZ 3330F + General, Metal RIE, Plating PGMEA AZ300 (0.26N TMAH) or AZ400K 1:4 (metal ion/ alkaline salts) SPR 220-3, SPR 220-4.5, K-PRO 3, KL6003
Datasheet NR7-3000P - Etch, General Cyclohexanone RD6 (0.24N or 0.26N TMAH) RR4 (DMSO), Acetone
Datasheet APOL-LO 3202 - Liftoff PGMEA 0.26N TMAH NMP, DMSO
IP-Dip - Nanoscribe, Epoxy Ethoxylated acrylates PGMEA, IPA
HARE SQ 2 - Epoxy Cyclopentanone, gamma butyro lactone PGMEA SU-8 2005
HARE SQ 50 - Epoxy Cyclopentanone, gamma butyro lactone PGMEA SU-8 2050

Stockroom Photoresists

Resist Tone Notes Alternatives Datasheet
SU-8 2005 - Epoxy HARE SQ 2 Datasheet
SU-8 2050 - Epoxy HARE SQ 50 Datasheet
SU-8 2100 - Epoxy HARE SQ 50 Datasheet
SU-8 3050 - Epoxy HARE SQ 50 Datasheet

Standard e-beam Resists

Resist Tone Notes Alternatives Datasheet
495 PMMA A8 + Lower Resolution Datasheet
495 PMMA A4 + Lower Resolution Datasheet
495 PMMA A2 + Lower Resolution Datasheet
950 PMMA A4 + High Resolution Datasheet
950 PMMA A2 + High Resolution 1000 HARP 0.1 Datasheet
1000 HARP 1.3 + High Resolution Datasheet
1000 HARP 0.1 + High Resolution 950 PMMA A2 Datasheet

Stockroom e-beam Resists

Resist Tone Notes Alternatives Datasheet
ZEP 520A + Thicker formulation Datasheet
ZEP 520A-7 + Thinner formulation Datasheet
H-SiQ 6% - HSQ Equivalent Datasheet

Other Resists

Resist Tone Notes Alternatives Datasheet
LOR 3A N/A Liftoff, Non-imaging Datasheet
PMGI SF 5S N/A Liftoff, Non-imaging Datasheet
PMGI SF 2S N/A Liftoff, Non-imaging Datasheet
NXR-1025 N/A Stockroom, Nanoimprint resist Datasheet

Miscellaneous

These may be available but are not guaranteed to be stocked

Resist Tone Notes Alternatives Datasheet
KL5305 + General S1805 Datasheet
KL5315 + General S1813 Datasheet
KL6003 + SPR 220-3, SPR 220-4.5 Datasheet
K-PRO 3 + Plating, Etching SPR 220-3, SPR 220-4.5 Datasheet
AZ 12XT-20PL-15 + CAR (i-line), Plating, Packaging, Deep Etch SPR 220-7, AZ P4620 Datasheet
AZ P4620 + Thick Resist, Plating, Packaging SPR 220-7, AZ 12XT-20PL-15 Datasheet
ma-N 2403 - e-beam/DUV Mix and Match Datasheet
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