Difference between revisions of "Au master recipe"

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> [[Denton_Explorer14_Magnetron_Sputterer#Process_data_&_master_recipes | Click here to return to PVD-05]]  <
 
> [[Denton_Explorer14_Magnetron_Sputterer#Process_data_&_master_recipes | Click here to return to PVD-05]]  <
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Step T006 is the deposition step.
  
 
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Latest revision as of 11:31, 31 January 2023

> Click here to return to PVD-05 <

Step T006 is the deposition step.

Step Number T000 T001 T002 T003 T004 T005 T006 T007 T008 T009 T010 T011 T012 T013
Step Time (sec) 5 30 30 30 30 30 [dep] 30 30 30 30 30 300 5
Min Vacuum Setpoint (Torr)
Gas - (PID or Fixed) PID PID PID PID PID PID PID PID PID PID PID
Gas - PID Master Gas Select 1 1 1 1 1 1 1 1 1 1 1
Gas1 - Setpoint (sccm) 10 10 10 10 10 10 10 10 10 10 10
Gas2 - Setpoint (sccm)
Gas PID Pressure (mTorr) 3 3 3 3 3 3 3 3 3 3 3
RF Source - Sputter (Watts)
RF Source - Cathode Select
RF Source - Shutter
DC 1 Source - Sputter (Watts) 25 50 75 100 125 140 120 100 80 60 25
DC 1 Source - Cathode Select 1 1 1 1 1 1 1 1 1 1 1
DC 1 Source - Shutter Open
DC 2 Source - Sputter (Watts)
DC 2 Source - Shutter
Pressure Control (Throttle) Yes Yes Yes Yes Yes Yes Yes Yes Yes Yes Yes Yes
Ignition Pressure (mTorr)
Rotation Speed (0-100%) 50 50 50 50 50 50 50 50 50 50 50 50 50
End Process (Yes) Yes