Difference between revisions of "Litho Workstation for BEAMER and TRACER"
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m (Changed protection level for "Litho Workstation for BEAMER and TRACER" ([Edit=Allow only autoconfirmed users] (indefinite) [Move=Allow only autoconfirmed users] (indefinite))) |
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===== SOPs & Troubleshooting ===== | ===== SOPs & Troubleshooting ===== | ||
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| + | ===== Online Webinars and Training Materials ===== | ||
| + | * [https://www.genisys-gmbh.com/webinar-series-beamer-training.html BEAMER Training Webinar] | ||
| + | * [https://www.genisys-gmbh.com/webinar-series-proximity-effect-in-e-beam-lithography.html Proximity Effect Webinar] | ||
| + | * [https://www.genisys-gmbh.com/applications.html Application Notes] | ||
Revision as of 13:21, 31 May 2022
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| Tool Name | GenIsys BEAMER & TRACER Software |
|---|---|
| Instrument Type | Lithography |
| Staff Manager | David Barth |
| Lab Location | Bay 2 |
| Tool Manufacturer | GenIsys |
| Tool Model | BEAMER / TRACER |
| NEMO Designation | {{{NEMO_Designation}}} |
| Lab Phone | XXXXX |
| SOP Link | |
Description
Pattern data for electron beam (e-beam), mask aligner and laser lithography is prepared using a software packages called BEAMER and TRACER by GenISys. The software package offers advanced data preparation, 2D and 3D proximity effect correction (PEC), process modeling and simulation for direct write applications in both e-beam and laser lithography.
Applications
- E-beam lithography data preparation
- Laser lithography data preparation