Difference between revisions of "Elionix ELS-7500EX E-Beam Lithography System"

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===== SOPs & Troubleshooting =====
 
===== SOPs & Troubleshooting =====
 
* [https://repository.upenn.edu/scn_sop/21/ SOP]
 
* [https://repository.upenn.edu/scn_sop/21/ SOP]
* March 4, 2022: There is a minor issue with the vacuum in the loadlock. The loadlock will not pump down from a partially evacuated state. In order to pump the loadlock if it was not already vented, you must first vent it, and then pump it down again.
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* <s>March 4, 2022: There is a minor issue with the vacuum in the loadlock. The loadlock will not pump down from a partially evacuated state. In order to pump the loadlock if it was not already vented, you must first vent it, and then pump it down again.</s> Resolved on May 10, 2022.
  
 
===== Resist and Process Data =====
 
===== Resist and Process Data =====

Revision as of 10:21, 17 May 2022


Elionix ELS-7500EX E-Beam Lithography System
EBL-01.jpeg
Tool Name Elionix ELS-7500EX E-Beam Lithography System
Instrument Type Lithography
Staff Manager David Barth
Lab Location Bay 4
Tool Manufacturer Elionix
Tool Model ELS-7500EX
NEMO Designation {{{NEMO_Designation}}}
Lab Phone 8-9799
SOP Link SOP

Description

The Elionix ELS-7500EX is an electron beam lithography tool capable of high resolution patterning at 50 kV with currents from 10 pA to 20 nA.

Applications
  • Patterning of positive and negative e-beam resists with features from ~10 nm to micron scale
Allowed Materials
  • Standard semiconductor materials
  • Low vapor pressure metals
  • Resists

Resources

SOPs & Troubleshooting
  • SOP
  • March 4, 2022: There is a minor issue with the vacuum in the loadlock. The loadlock will not pump down from a partially evacuated state. In order to pump the loadlock if it was not already vented, you must first vent it, and then pump it down again. Resolved on May 10, 2022.
Resist and Process Data