Difference between revisions of "Cambridge Nanotech S200 ALD"

**Cambridge Nanotech S200 ALD**
Tool Name	Cambridge Nanotech S200 ALD
Instrument Type	Deposition
Staff Manager	Sam Azadi
Lab Location	Bay 1
Tool Manufacturer	Ultratech/Cambridge
Tool Model	S200
NEMO Designation	{{{NEMO_Designation}}}
Lab Phone	215-898-9736
SOP Link	QNF SOP

Revision as of 09:03, 27 September 2022

Description

The QNF Savannah ALD is equipped with high-speed pneumatic pulse valves to enable our unique Exposure Mode™ for thin film deposition on ultra high aspect ratio substrates. This proven precision thin film coating methodology can be used to deposit conformal, uniform films on substrates with aspect ratios of greater than > 2000:1.

The QNF Savannah ALD is capable of holding substrates of different sizes (up to 200mm). The system is equipped with six precursor lines for deposition of Al₂O₃, HfO₂, TiO₂, and SiO₂.

Applications

Aluminum oxide deposition
Silicon dioxide deposition
Titanium oxide deposition
Hafnium oxide deposition
Deposition of other films can be made available upon request

Allowed material in ALD System

Si, Si_xN_y, SiO₂, SOI
Hard masks compatible with process temperature

Resources

SOPs & Troubleshooting

QNF SOP

Protocols and Reports

ALD deposition of SiO₂ using BDEAS and Ozone precursors

Most Recent Deposition Rate

Material Name	Precursor 1	Precursor 2
Al<2>O<3>	Ag	450
Aluminum	Al	450
Gold	Au	140

@@ Line 41: / Line 41: @@
 * [https://repository.upenn.edu/scn_protocols/72/ ALD deposition of SiO<sub>2</sub> using BDEAS and Ozone precursors]
+===== Most Recent Deposition Rate =====
+{| class="wikitable sortable"
+! Material Name !! Precursor 1 !! Precursor 2 !!
+|-
+| Al<2>O<3> || Ag || 450
+|-
+| Aluminum || Al || 450
+|-
+| Gold || Au || 140
+|-
+|
+|}