Difference between revisions of "Nanonex NX2600 Nanoimprint"
Jump to navigation
Jump to search
m (Protected "Nanonex NX2600 Nanoimprint" ([Edit=Allow only administrators] (indefinite) [Move=Allow only administrators] (indefinite)) [cascading]) |
m (Changed protection level for "Nanonex NX2600 Nanoimprint" ([Edit=Allow only autoconfirmed users] (indefinite) [Move=Allow only autoconfirmed users] (indefinite))) |
(No difference)
|
Revision as of 12:32, 2 May 2022
Tool Name | Nanonex NX2600 Nanoimprint |
---|---|
Instrument Type | Deposition |
Staff Manager | David Barth |
Lab Location | Bay 2 |
Tool Manufacturer | Nanonex |
Tool Model | NX-2600 |
NEMO Designation | {{{NEMO_Designation}}} |
Lab Phone | XXXXX |
SOP Link | SOP |
Description
The NX-2600 Nanoimprint Lithography (NIL) instrument allows rapid high resolution replication of template features into spin-coated resist on a range of substrates. The instrument is capable of thermal embossing (T-NIL) using thermoplastic polymers, as well as UV-assisted embossing (UV-NIL) using UV curable polymers. The NX-2600 utilizes Air Cushion Press (ACP) technology that provides excellent uniformity of the pattern transfer.
Applications
- Thermal nanoimprint lithography
- UV nanoimprint lithography