Difference between revisions of "RTA-02"
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== Description == | == Description == | ||
| − | The Rapid Thermal Annealer-02 anneals the sample up to 1200° C. The processes can be run under atmospheric pressure in Nitrogen, Forming Gas, and Argon environments. The tool can hold 4’’ wafers or smaller chips. | + | The Rapid Thermal Annealer-02 anneals the sample up to 1200° C. The processes can be run under atmospheric pressure in Nitrogen, Forming Gas, and Argon environments. The tool can hold 4’’ wafers or smaller chips. |
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== Resources == | == Resources == | ||
===== SOP ===== | ===== SOP ===== | ||
<pdf height="800"> File:RTA02_SOP_20250131.pdf</pdf> | <pdf height="800"> File:RTA02_SOP_20250131.pdf</pdf> | ||
Latest revision as of 14:06, 31 January 2025
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| Tool Name | Rapid Thermal Annealer - 02 |
|---|---|
| Instrument Type | Thermal Processing |
| Staff Manager | Lucas Barreto |
| Lab Location | Bay 1 |
| Tool Manufacturer | AET |
| Tool Model | Thermal RX |
| NEMO Designation | RTA-01 |
| Lab Phone | 215-898-9736 |
| SOP Link | {{{SOP Link}}} |
Description
The Rapid Thermal Annealer-02 anneals the sample up to 1200° C. The processes can be run under atmospheric pressure in Nitrogen, Forming Gas, and Argon environments. The tool can hold 4’’ wafers or smaller chips.
Resources
SOP