Difference between revisions of "Lesker PVD75 E-beam Evaporator"

**Lesker PVD75 E-Beam/Thermal Evaporator**
Tool Name	Lesker PVD75 E-Beam/Thermal Evaporator
Instrument Type	Deposition
Staff Manager	David Jones
Lab Location	Bay 2
Tool Manufacturer	Kurt J. Lesker
Tool Model	PVD75
NEMO Designation	{{{NEMO_Designation}}}
Nearest Phone	XXXXX
SOP Link	SOP

Revision as of 08:35, 29 March 2022

Blurb goes here.

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 | imagecaption =
 | Instrument_Type = Deposition
-| Staff_Manager = David Barth
+| Staff_Manager = David Jones
 | Lab_Location = Bay 2
 | Tool_Manufacturer = Kurt J. Lesker
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 == Description ==
-The Kurt J. Lesker PVD 75 thin film deposition system is equipped for electron-beam (4 pockets) and thermal evaporation (2 sources). The evaporator is used to deposit metals and semiconductor materials. E-beam is the preferred evaporation technique for the high melting point materials. Evaporation provides directionality in depositions,  which is beneficial when doing liftoff metallization (as opposed to conformal coating with sputtering deposition). Crystal oscillators are used to monitor deposition rates and thickness.
+Blurb goes here.
-The system can accommodate pieces through wafers up to 150 mm in diameter and is configured with platen rotation and a cooling stage.
 ===== Films =====
-* ADD MATERIALS HERE
+* Ti
+* Cr
+* Au
+* Pd