Difference between revisions of "IntlVac NanoQuest 1 IBE"

**IntlVac Nanoquest 1**
	[[]]
Tool Name	IntlVac IBE
Instrument Type	Etch
Staff Manager	Sam Azadi
Lab Location	Bay 2
Tool Manufacturer	IntlVac
Tool Model	Nanoquest 1
NEMO Designation	DE-01
Lab Phone	215-898-9748
SOP Link	SOP

Latest revision as of 09:07, 28 October 2024

Description

NanoQuest 1 is an ion miller connected to Ar gas and capable of etch small mm-scale samples up to full 4" wafers. The tool is equipped with a secondary ion mass spectroscopy (SIMS) unit and is capable of etch with manual endpoint detection. The stage has a tilt motor that allows for etch angles between 0 (directly facing the beam) and 90 degrees (parallel to the beam).

The tool in QNF is connected to Ar gas and can etch samples up to 4" wafer. Available beam voltages are: 300 V, 400 V, 450 V, and 500 V

Applications

Ion milling

Resources

manual loading/unloading operation video

Standard Process Information

Material	Voltage [V]	tilt [degree]	Etch Rate [nm/min]
Al₂O₃	400	45	21
SiO₂	300	0	15
SiO₂	500	0	40

Process information from user community

Material	Voltage [V]	tilt [degree]	Etch Rate [nm/min]
Al	400	45	60
Al	500	45	100
AlN	500	45	52
AlSc(.36)N	500	45	50
HfO2	300	0	20
LiNbO3	500	0	40
Pt	500	45	20
SiO2	500	45	78

SOPs & Troubleshooting

@@ Line 35: / Line 35: @@
 ! Material || Voltage [V] || tilt [degree] || Etch Rate [nm/min]
 |-
+| [[ Cambridge Nanotech S200 ALD | ''' Al<sub>2</sub>O<sub>3<sub>''']] || 400 || 45 || 21
+|-
 | [[ Oxford PlasmaLab 100 PECVD | ''' SiO<sub>2<sub>''']] || 300 || 0 || 15
 |-
 | [[ Oxford PlasmaLab 100 PECVD | ''' SiO<sub>2<sub>''']] || 500 || 0 || 40
-|-
-| [[ Cambridge Nanotech S200 ALD | ''' Al<sub>2</sub>O<sub>3<sub>''']] || 400 || 45 || 21
 |}