Difference between revisions of "IntlVac NanoQuest 1 IBE"

**IntlVac Nanoquest 1**
	[[]]
Tool Name	IntlVac IBE
Instrument Type	Etch
Staff Manager	Sam Azadi
Lab Location	Bay 2
Tool Manufacturer	IntlVac
Tool Model	Nanoquest 1
NEMO Designation	DE-01
Lab Phone	215-898-9748
SOP Link	SOP

Revision as of 09:59, 3 October 2024

Description

Nanoquest 1 is an ion miller connected to Ar gas and capable of etch small mm-scale samples up to full 4" wafers. The tool is equipped with a secondary ion mass spectroscopy (SIMS) unit and is capable of etch with manual endpoint detection. The stage has a tilt motor that allows for etch angles between 0 (directly facing the beam) and 90 degrees (parallel to the beam).

The tool in QNF is connected to Ar gas and can etch samples up to 4" wafer. Available beam voltages are: 300 V, 400 V, 450 V, and 500 V

Applications

Ion milling

Resources

manual loading/unloading operation video

Standard Process Information

- Etch rate of SiO2 deposited with QNF's CVD-01 at 500 V, 0 degree, 0 rotation is ~ 40 nm/min
- Etch rate of SiO2 deposited with QNF's CVD-01 at 300 V, 0 degree, 0 rotation is ~ 15 nm/min

Process information from user community

Material	Voltage [V]	tilt [degree]	Etch Rate [nm/min]
Al	400	45	60
Al	500	45	100
AlScN	500	45	43
Pt	500	45	20
LiNbO3	500	0	40

SOPs & Troubleshooting

@@ Line 37: / Line 37: @@
 ==== Process information from user community ====
- - Etch rate of Al deposited with QNF's PVD-06 at 400 V, 45 degree, 15 RPM rotation is ~ 60 nm/min
- - Etch rate of Al deposited with QNF's PVD-06 at 500 V, 45 degree, 15 RPM rotation is ~ 100 nm/min
- - Etch rate of AlScN deposited with QNF's PVD-06 at 500 V, 45 degree, 15 RPM rotation is ~ 43 nm/min
- - Etch rate of Pt deposited with QNF's PVD-02 at 500 V, 45 degree, 15 RPM rotation is ~ 20 nm/min
- - Etch rate of LiNbO3 at 500 V, 0 degree, 10 RPM rotation is ~ 40 nm/min
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