Difference between revisions of "Micromanipulator 4060 Probe Station"
Jump to navigation
Jump to search
| Line 22: | Line 22: | ||
* Material resistivity measurements | * Material resistivity measurements | ||
* I-V characterization | * I-V characterization | ||
| − | * | + | * Gate/Drain measurements |
== Resources == | == Resources == | ||
Revision as of 10:27, 26 April 2024
 |
|
| Tool Name | Micromanipulator 4060 Probe Station |
|---|---|
| Instrument Type | Electrical Characterization |
| Staff Manager | Dan Sabrsula |
| Lab Location | Cleanroom Corridor |
| Tool Manufacturer | Micromanipulator |
| Tool Model | Probe Station |
| NEMO Designation | MET-09 |
| Lab Phone | XXXXX |
| SOP Link | [ NA] |
Description
The system allows probing of wafers, MOSFETs, or samples of widely varying dimensions. The probe station is set up for use with up to two Keithley 2450 Source Measure Units (SMU) across four articulated probe heads. Each probe head uses a Tungsten probe tip with a 500nm tip radius to make contact with the device under test. The probe station is capable of performing a wide variety of measurements including: 2-point and 4-point resistivity measurements, time dependent I-V characterization, and other highly customizable tests.
Applications
- Material resistivity measurements
- I-V characterization
- Gate/Drain measurements
Resources
SOPs & Troubleshooting
- [NA - staff assisted use only]