Difference between revisions of "Oxford PlasmaLab 100 PECVD"
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{{EquipmentInfo | {{EquipmentInfo | ||
| − | | name = | + | | name = Oxford PlasmaLab 100 PECVD |
| − | | Tool_Name = | + | | Tool_Name = Oxford PlasmaLab 100 PECVD |
| image = [[Image:ALD-01.jpeg|300px]] | | image = [[Image:ALD-01.jpeg|300px]] | ||
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| Staff_Manager = Sam Azadi | | Staff_Manager = Sam Azadi | ||
| Lab_Location = Bay 2 | | Lab_Location = Bay 2 | ||
| − | | Tool_Manufacturer = | + | | Tool_Manufacturer = Oxford |
| − | | Tool_Model = | + | | Tool_Model = PlasmaLab 100 |
| − | | Iris_Designation = | + | | Iris_Designation = CVD-01 |
| Lab_Phone = XXXXX | | Lab_Phone = XXXXX | ||
| − | | SOP Link = [https://repository.upenn.edu/scn_sop/ | + | | SOP Link = [https://repository.upenn.edu/scn_sop/5/] |
}} | }} | ||
Revision as of 14:28, 16 March 2022
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| Tool Name | Oxford PlasmaLab 100 PECVD |
|---|---|
| Instrument Type | Deposition |
| Staff Manager | Sam Azadi |
| Lab Location | Bay 2 |
| Tool Manufacturer | Oxford |
| Tool Model | PlasmaLab 100 |
| NEMO Designation | {{{NEMO_Designation}}} |
| Lab Phone | XXXXX |
| SOP Link | [1] |
Description
The QNF Savannah ALD is equipped with high-speed pneumatic pulse valves to enable our unique Exposure Mode™ for thin film deposition on ultra high aspect ratio substrates. This proven precision thin film coating methodology can be used to deposit conformal, uniform films on substrates with aspect ratios of greater than > 2000:1.
The QNF Savannah ALD is capable of holding substrates of different sizes (up to 200mm). The system is equipped with six precursor lines for deposition of Al2O3, HfO2, TiO2, and SiO2.
Applications
- Aluminum oxide deposition
- Silicon dioxide deposition
- Titanium oxide deposition
- Hafnium oxide deposition
- Deposition of other films can be made available upon request
Allowed material in ALD System
- Si, SixNy, SiO2, SOI
- Hard masks compatible with process temperature