Difference between revisions of "Fiji G2 ALD"
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| − | [[Category:Deposition]] | + | [[Category:Deposition]][[Category:Atomic Layer Deposition]][[Category:Equipment]] |
{{EquipmentInfo | {{EquipmentInfo | ||
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| imagecaption = | | imagecaption = | ||
| Instrument_Type = Deposition | | Instrument_Type = Deposition | ||
| − | | Staff_Manager = | + | | Staff_Manager = |
| Lab_Location = Removed | | Lab_Location = Removed | ||
| Tool_Manufacturer = Veeco | | Tool_Manufacturer = Veeco | ||
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| − | '''ALD-02 is no longer available''' | + | '''ALD-02 has been removed from QNF and is no longer available''' |
== Description == | == Description == | ||
Latest revision as of 15:40, 25 July 2025
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| Tool Name | Veeco Fiji G2 |
|---|---|
| Instrument Type | Deposition |
| Staff Manager | |
| Lab Location | Removed |
| Tool Manufacturer | Veeco |
| Tool Model | Fiji G2 |
| NEMO Designation | ALD-02 |
| Nearest Phone | 215-898-9736 |
| SOP Link | SOP |
ALD-02 has been removed from QNF and is no longer available
Description
Fiji is a plasma and thermal ALD equipped with high-speed pneumatic pulse valves to enable our unique Exposure Mode for thin film deposition on Ultra High Aspect Ratio substrates. This proven precision thin film coating methodology can be used to deposit conformal, uniform films on substrates with aspect ratios of greater than > 2000:1. Fiji is capable of holding substrates of different sizes up to 200mm. The Fiji thin film deposition system is equipped with TMA, DEZ, and water.
Films
Al2O3
ZnO