Difference between revisions of "RTA-01"
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| − | [[Category:Thermal Processing]] | + | [[Category:Thermal Processing]][[Category:Equipment]] |
{{EquipmentInfo | {{EquipmentInfo | ||
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| NEMO_Designation = RTA-01 | | NEMO_Designation = RTA-01 | ||
| Lab_Phone = 215-898-9736 | | Lab_Phone = 215-898-9736 | ||
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== Resources == | == Resources == | ||
===== SOP ===== | ===== SOP ===== | ||
| − | <pdf height="800"> File: | + | <pdf height="800"> File:RTA01_SOP_20240909.pdf</pdf> |
Latest revision as of 12:54, 28 July 2025
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| Tool Name | Rapid Thermal Annealer - 01 |
|---|---|
| Instrument Type | Thermal Processing |
| Staff Manager | Lucas Barreto |
| Lab Location | Bay 1 |
| Tool Manufacturer | AET |
| Tool Model | Thermal RX |
| NEMO Designation | RTA-01 |
| Nearest Phone | 215-898-9736 |
| SOP Link | {{{SOP Link}}} |
Description
The Rapid Thermal Annealer-01 anneals the sample up to 1200° C. The processes can be run under atmospheric pressure in Oxygen, Nitrogen, Forming Gas, and Argon environments. The tool can hold 4’’ wafers or smaller chips. Only MOS-compatible materials are allowed. Compound semiconductors and metals are not allowed.
Resources
SOP