Difference between revisions of "Intlvac E-beam Evaporator"
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| name = Intlvac E-Beam Evaporator | | name = Intlvac E-Beam Evaporator | ||
| Tool_Name = Intlvac E-Beam Evaporator | | Tool_Name = Intlvac E-Beam Evaporator | ||
| − | | image = [[Image:PVD- | + | | image = [[Image:PVD-09.jpg|300px]] |
| imagecaption = | | imagecaption = | ||
| Instrument_Type = Physical vapor deposition | | Instrument_Type = Physical vapor deposition | ||
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| Lab_Location = Bay 2 | | Lab_Location = Bay 2 | ||
| Tool_Manufacturer = Intlvac | | Tool_Manufacturer = Intlvac | ||
| − | | Tool_Model = | + | | Tool_Model = Nanochrome |
| NEMO_Designation = PVD-09 | | NEMO_Designation = PVD-09 | ||
| Lab_Phone = 215-898-9748 | | Lab_Phone = 215-898-9748 | ||
| − | | SOP Link = [https:// | + | | SOP Link = [https://nemo.nano.upenn.edu/media/tool_documents/pvd-09-intlvac-evap/PVD09_SOP_v01.docx.pdf SOP] |
}} | }} | ||
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===== The tool ===== | ===== The tool ===== | ||
| − | The IntlVac Electron Beam Evaporator has a base process chamber pressure in the e-8 Torr range with substrate heating and ozone purging capabilities. Deposition rates are monitored by an automated magazine of 6MHz crystals. The tool can be used to process a single 4 inch wafer at a time or a selection of small chips/pieces. | + | The IntlVac Electron Beam Evaporator has a base process chamber pressure in the low e-8 Torr range with substrate heating and ozone purging capabilities. Deposition rates are monitored by an automated magazine of 6MHz crystals. The tool can be used to process a single 4 inch wafer at a time or a selection of small chips/pieces. |
===== Available materials ===== | ===== Available materials ===== | ||
The tool contains the following materials: | The tool contains the following materials: | ||
| − | * Al- Aluminum | + | * Al - Aluminum |
* Ti - Titanium | * Ti - Titanium | ||
| − | |||
== Resources == | == Resources == | ||
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===== SOPs & Troubleshooting ===== | ===== SOPs & Troubleshooting ===== | ||
| − | + | * [https://nemo.nano.upenn.edu/media/tool_documents/pvd-09-intlvac-evap/PVD09_SOP_v01.docx.pdf PVD-09 SOP] | |
| − | |||
| − | |||
Latest revision as of 15:46, 20 September 2024
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| Tool Name | Intlvac E-Beam Evaporator |
|---|---|
| Instrument Type | Physical vapor deposition |
| Staff Manager | David Barth |
| Lab Location | Bay 2 |
| Tool Manufacturer | Intlvac |
| Tool Model | Nanochrome |
| NEMO Designation | PVD-09 |
| Lab Phone | 215-898-9748 |
| SOP Link | SOP |
Description
The tool
The IntlVac Electron Beam Evaporator has a base process chamber pressure in the low e-8 Torr range with substrate heating and ozone purging capabilities. Deposition rates are monitored by an automated magazine of 6MHz crystals. The tool can be used to process a single 4 inch wafer at a time or a selection of small chips/pieces.
Available materials
The tool contains the following materials:
- Al - Aluminum
- Ti - Titanium