Difference between revisions of "Fiji G2 ALD"
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===== Films ===== | ===== Films ===== | ||
| − | + | [[ALD-02: Titanium Oxide Deposition | Titanium Dioxide Deposition ]] | |
| − | + | ||
| + | Al2O3 | ||
| + | |||
| + | ZnO | ||
Latest revision as of 15:49, 7 June 2024
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| Tool Name | Veeco Fiji G2 |
|---|---|
| Instrument Type | Deposition |
| Staff Manager | Sam Azadi |
| Lab Location | Bay 2 |
| Tool Manufacturer | Veeco |
| Tool Model | Fiji G2 |
| NEMO Designation | ALD-02 |
| Lab Phone | 215-898-9736 |
| SOP Link | SOP |
Description
Fiji is a plasma and thermal ALD equipped with high-speed pneumatic pulse valves to enable our unique Exposure Mode for thin film deposition on Ultra High Aspect Ratio substrates. This proven precision thin film coating methodology can be used to deposit conformal, uniform films on substrates with aspect ratios of greater than > 2000:1. Fiji is capable of holding substrates of different sizes up to 200mm. The Fiji thin film deposition system is equipped with TMA, DEZ, and water.
Films
Al2O3
ZnO