Difference between revisions of "Fiji G2 ALD"
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| Instrument_Type = Deposition | | Instrument_Type = Deposition | ||
| Staff_Manager = [[Sam Azadi | Sam Azadi]] | | Staff_Manager = [[Sam Azadi | Sam Azadi]] | ||
| − | | Lab_Location = | + | | Lab_Location = Removed |
| Tool_Manufacturer = Veeco | | Tool_Manufacturer = Veeco | ||
| Tool_Model = Fiji G2 | | Tool_Model = Fiji G2 | ||
| Line 15: | Line 15: | ||
| SOP Link = [https://repository.upenn.edu/scn_sop/6/ SOP] | | SOP Link = [https://repository.upenn.edu/scn_sop/6/ SOP] | ||
}} | }} | ||
| + | |||
| + | '''ALD-02 is no longer available''' | ||
== Description == | == Description == | ||
| − | Fiji is a plasma and thermal ALD equipped with high-speed pneumatic pulse valves to enable our unique Exposure Mode for thin film deposition on Ultra High Aspect Ratio substrates. This proven precision thin film coating methodology can be used to deposit conformal, uniform films on substrates with aspect ratios of greater than > 2000:1. Fiji is capable of holding substrates of different sizes up to 200mm. The Fiji thin film deposition system is equipped with TMA, DEZ. | + | Fiji is a plasma and thermal ALD equipped with high-speed pneumatic pulse valves to enable our unique Exposure Mode for thin film deposition on Ultra High Aspect Ratio substrates. This proven precision thin film coating methodology can be used to deposit conformal, uniform films on substrates with aspect ratios of greater than > 2000:1. Fiji is capable of holding substrates of different sizes up to 200mm. The Fiji thin film deposition system is equipped with TMA, DEZ, and water. |
===== Films ===== | ===== Films ===== | ||
| − | + | [[ALD-02: Titanium Oxide Deposition | Titanium Dioxide Deposition ]] | |
| − | + | ||
| + | Al2O3 | ||
| + | |||
| + | ZnO | ||
Latest revision as of 13:52, 15 January 2025
 |
|
| Tool Name | Veeco Fiji G2 |
|---|---|
| Instrument Type | Deposition |
| Staff Manager | Sam Azadi |
| Lab Location | Removed |
| Tool Manufacturer | Veeco |
| Tool Model | Fiji G2 |
| NEMO Designation | ALD-02 |
| Lab Phone | 215-898-9736 |
| SOP Link | SOP |
ALD-02 is no longer available
Description
Fiji is a plasma and thermal ALD equipped with high-speed pneumatic pulse valves to enable our unique Exposure Mode for thin film deposition on Ultra High Aspect Ratio substrates. This proven precision thin film coating methodology can be used to deposit conformal, uniform films on substrates with aspect ratios of greater than > 2000:1. Fiji is capable of holding substrates of different sizes up to 200mm. The Fiji thin film deposition system is equipped with TMA, DEZ, and water.
Films
Al2O3
ZnO