Difference between revisions of "CEE 200X Spinner"

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[[Category:Soft Lithography]]
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[[Category:Back End]]
  
 
{{EquipmentInfo
 
{{EquipmentInfo
| name = Spinner - SU8/PDMS
+
| name = CEE 200X Spinner
| Tool_Name = Spinner - SU8/PDMS
+
| Tool_Name = CEE 200X Spinner
 
| image = [[Image:SPN-07.png |300px]]
 
| image = [[Image:SPN-07.png |300px]]
 
| imagecaption =  
 
| imagecaption =  
| Instrument_Type = Lithography
+
| Instrument_Type = Back End
 
| Staff_Manager = [[Ana Cohen | Ana Cohen]]
 
| Staff_Manager = [[Ana Cohen | Ana Cohen]]
| Lab_Location = Soft Lithography
+
| Lab_Location = Singh 124
 
| Tool_Manufacturer = CEE
 
| Tool_Manufacturer = CEE
 
| Tool_Model = 200X
 
| Tool_Model = 200X

Latest revision as of 15:13, 12 March 2024


CEE 200X Spinner
SPN-07.png
Tool Name CEE 200X Spinner
Instrument Type Back End
Staff Manager Ana Cohen
Lab Location Singh 124
Tool Manufacturer CEE
Tool Model 200X
NEMO Designation SPN-07
Lab Phone 3-9639
SOP Link SOP

Description

Spinner for coating substrates with resists and protective coverings for laser-cutting and dicing. Can also be used to apply PDMS. Control of ramp rate and speed. Includes wafer centering step.

Resources

SOPs & Troubleshooting
  • SOP: SOP
  • Video for basic tool use (6.47min):Video