Difference between revisions of "Cu master recipe"

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(Cu master recipe)
 
 
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[[Denton_Explorer14_Magnetron_Sputterer | Return to PVD-05 ]]
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> [[Denton_Explorer14_Magnetron_Sputterer#Process_data_&_master_recipes | Click here to return to PVD-05]] <
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Step T004 is the deposition step and step T005 is the cool-down step (300 s).
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{| class="wikitable"
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! Step Number || T000 || T001 || T002 || T003 || T004 || T005 || T006
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|-
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|-
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| Step Time (sec) || 5 || 120  || 60 || 60 || [dep] || 300 || 5
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|-style="background-color:#FFFFFF"
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| Min Vacuum Setpoint (Torr) ||  ||  ||  ||  ||  ||  ||
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|-
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|  ||  ||  ||  ||  ||  ||  ||
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|-style="background-color:#DBFEFF"
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| Gas - (PID or Fixed) ||  ||  PID || PID || PID || PID ||  ||
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|-style="background-color:#FFFFFF"
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| Gas - PID Master Gas Select ||  || 1 || 1 || 1 || 1 ||  ||
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|-
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| Gas1 - Setpoint (sccm) ||  ||  10 || 10 || 10 || 10 ||  ||
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|-style="background-color:#FFFFFF"
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| Gas2 - Setpoint (sccm) ||  ||  ||  ||  ||  ||  ||
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|-
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|  ||  ||  ||  ||  ||  ||  ||
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|-style="background-color:#DEB4DC"
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|Gas PID Pressure (mTorr) ||  ||  10 || 5 || 3 || 3 ||  ||
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|-style="background-color:#DCF5E9"
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| RF Source - Sputter (Watts) ||  ||  ||  ||  ||  ||  ||
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|-style="background-color:#DCF5E9"
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| RF Source - Cathode Select ||  ||  ||  ||  ||  ||  ||
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|-style="background-color:#DCF5E9"
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| RF Source - Shutter ||  ||  ||  ||  ||  ||  ||
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|-style="background-color:#ECFA6F"
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| DC 1 Source - Sputter (Watts) ||  ||  ||  ||  ||  ||  ||
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|-style="background-color:#ECFA6F"
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| DC 1 Source - Cathode Select ||  ||  ||  ||  ||  ||  ||
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|-style="background-color:#ECFA6F"
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| DC 1 Source - Shutter ||  ||  ||  ||  ||  ||  ||
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|-style="background-color:#FAD86F"
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| DC 2 Source - Sputter (Watts) ||  ||  100 || 200 || 300 || 400 ||  ||
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|-style="background-color:#FAD86F"
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|  ||  ||  ||  ||  ||  ||  ||
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|-style="background-color:#FAD86F"
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| DC 2 Source - Shutter ||  ||  ||  ||  || Open ||  ||
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|-style="background-color:#6FD2FA"
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| Pressure Control (Throttle) ||  ||  Yes || Yes || Yes || Yes ||  ||
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|-style="background-color:#FFFFFF"
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| Ignition Pressure (mTorr) ||  ||  ||  ||  ||  ||  ||
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|-
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|  ||  ||  ||  ||  ||  ||  ||
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|-style="background-color:#E8F213"
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| Rotation Speed (0-100%) ||  ||  50 || 50 || 50 || 50 || 50 ||
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|-
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| End Process (Yes) ||  ||  ||  ||  ||  ||  || Yes
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|}

Latest revision as of 14:02, 30 January 2023

> Click here to return to PVD-05 <

Step T004 is the deposition step and step T005 is the cool-down step (300 s).

Step Number T000 T001 T002 T003 T004 T005 T006
Step Time (sec) 5 120 60 60 [dep] 300 5
Min Vacuum Setpoint (Torr)
Gas - (PID or Fixed) PID PID PID PID
Gas - PID Master Gas Select 1 1 1 1
Gas1 - Setpoint (sccm) 10 10 10 10
Gas2 - Setpoint (sccm)
Gas PID Pressure (mTorr) 10 5 3 3
RF Source - Sputter (Watts)
RF Source - Cathode Select
RF Source - Shutter
DC 1 Source - Sputter (Watts)
DC 1 Source - Cathode Select
DC 1 Source - Shutter
DC 2 Source - Sputter (Watts) 100 200 300 400
DC 2 Source - Shutter Open
Pressure Control (Throttle) Yes Yes Yes Yes
Ignition Pressure (mTorr)
Rotation Speed (0-100%) 50 50 50 50 50
End Process (Yes) Yes
Retrieved from "https://wiki.nano.upenn.edu/wiki/index.php?title=Cu_master_recipe&oldid=916"