Cambridge Nanotech S200 ALD

Cambridge Nanotech S200 ALD

Tool Name	Cambridge Nanotech S200 ALD
Instrument Type	Deposition
Staff Manager	Sam Azadi
Lab Location	Bay 1
Tool Manufacturer	Ultratech/Cambridge
Tool Model	S200
NEMO Designation	{{{NEMO_Designation}}}
Lab Phone	215-898-9736
SOP Link	QNF SOP

Description

The QNF Savannah ALD is equipped with high-speed pneumatic pulse valves to enable our unique Exposure Mode™ for thin film deposition on ultra high aspect ratio substrates. This proven precision thin film coating methodology can be used to deposit conformal, uniform films on substrates with aspect ratios of greater than > 2000:1.

The QNF Savannah ALD is capable of holding substrates of different sizes (up to 200mm). The system is equipped with six precursor lines for deposition of Al₂O₃, HfO₂, TiO₂, and SiO₂.

Applications

• Aluminum oxide deposition
• Silicon dioxide deposition
• Titanium oxide deposition
• Hafnium oxide deposition
• Deposition of other films can be made available upon request

Allowed material in ALD System

• Si, Si_xN_y, SiO₂, SOI
• Hard masks compatible with process temperature

Resources

SOPs & Troubleshooting

• QNF SOP

Protocols and Reports

• ALD deposition of SiO₂ using BDEAS and Ozone precursors

Most Recent Deposition Rate

Material Name	Precursor 1			Precursor 2			Dep. temperature [C]	Carrier flow [sccm]	Dep. rate [A/cyc]	Date [MM/DD/YY]
	Name	Pulse time [s]	Wait time [s]	Name	Pulse time [s]	Wait time [s]
Al2O3	TMA	0.015	5	H2O	0.015	5	200	20	1	09/24/22
HfO2	TDMAHf	0.15	8	H2O	0.015	5	200	20	1.3	09/24/22
TiO2	TDMATi	0.4	10	H2O	0.015	5	250	20	0.4	05/02/22