Difference between revisions of "Lesker Nano-36 Thermal Evaporator"
Jump to navigation
Jump to search
m (Protected "Lesker Nano-36 Thermal Evaporator" ([Edit=Allow only administrators] (indefinite) [Move=Allow only administrators] (indefinite)) [cascading]) |
|
(No difference)
| |
Revision as of 10:43, 29 April 2022
 |
|
| Tool Name | Lesker Nano-36 Thermal Evaporator |
|---|---|
| Instrument Type | Deposition |
| Staff Manager | David Barth |
| Lab Location | Bay 2 |
| Tool Manufacturer | Kurt J. Lesker |
| Tool Model | Nano-36 |
| NEMO Designation | {{{NEMO_Designation}}} |
| Lab Phone | XXXXX |
| SOP Link | SOP |
Description
The Kurt J. Lesker Nano36 will evaporate a metal film under high vacuum while measuring the thickness in-sit by a thickness monitor. Up to four different materials can be loaded in one batch, and the evaporation sources are sufficiently isolated from each other by shields to prevent cross contamination. The wafer platen can accommodate sizes up to 150 mm.
Deposition Sources
- Ti
- Ni
- Cr
- Fe
- Pb
- NiCr
- Deposition of other films can be made available upon request