Difference between revisions of "Nanoscribe Photonic Professional GT"

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m (Changed protection level for "Nanoscribe Photonic Professional GT" ([Edit=Allow only autoconfirmed users] (indefinite) [Move=Allow only autoconfirmed users] (indefinite)))
 
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[[Category:Lithography]]
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[[Category:Lithography]][[Category:Photolithography]][[Category:Equipment]]
  
 
{{EquipmentInfo
 
{{EquipmentInfo
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| name = Nanoscribe Photonic Professional GT
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| name = Nanoscribe Photonic Professional GT+
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| Tool_Name = Nanoscribe Photonic Professional GT
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| Tool_Name = Nanoscribe Photonic Professional GT+
 
| image = [[Image:LW-02.jpeg|300px]]
 
| image = [[Image:LW-02.jpeg|300px]]
 
| imagecaption =  
 
| imagecaption =  
 
| Instrument_Type = Lithography
 
| Instrument_Type = Lithography
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| Staff_Manager = David Jones
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| Staff_Manager = [[Ana Cohen | Ana Cohen]]
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| Lab_Location = Bay 2
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| Lab_Location = Bay 6
 
| Tool_Manufacturer = Nanoscribe
 
| Tool_Manufacturer = Nanoscribe
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| Tool_Model = Photonic Professional GT
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| Tool_Model = Photonic Professional GT+
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| Iris_Designation = LW-02
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| NEMO_Designation = LW-02
 
| Lab_Phone = XXXXX
 
| Lab_Phone = XXXXX
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| SOP Link = [https://www.seas.upenn.edu/~nanosop/NanoScribe_3D_Printer.htm SOP]
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| SOP Link = [https://wiki.nano.upenn.edu/wiki/images/d/d4/LW-02_SOP.pdf SOP]
 
}}
 
}}
  
 
== Description ==
 
== Description ==
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The Nanoscribe Photonic Professional is an easy-to-operate table-top laser lithography system that enables the fabrication of true three-dimensional nanostructures using commercially available photoresists. Designed for the fabrication of photonic crystal structures, the instrument is also ideal for, e.g., generating three-dimensional scaffolds for biology, micro- and nanofluidic circuitry.
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The Nanoscribe Photonic Professional enables the fabrication of true 3D structures in the microscale via two-photon polymerization using a 780nm laser with ~100fs pulse, 80MHz repetition rate. This system allows for cutting-edge research and rapid prototyping in microfluidics, MEMS, microoptics, nanostructures and more.  
  
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===== Key Features =====
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'' '''Upgraded to GT+ in Dec 2024!''' Includes new housing with easier objective loading with 10x objective capability and greater print height (previously 3mm) ''
  
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* Laser power: 50-150 mW, Wavelength: 780 nm, Pulse ~100 fs, Repetition rate: 80 MHz
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====Tool Features====
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* Available for Conventional 3D printing mode, Dip-in Liquid mode and air mode
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* Laser Power: 50-150mW
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* 3D printing with lateral resolution ~ 200 nm, vertical resolution ~ 300 nm
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* Print Height: Up to 8mm
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* High-precision Piezo scanning range: 300 x 300 x 300 μm3
 
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* Motorized XY-scanning range: 100 x 100 mm2
 
  
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* Lateral resolution ~ 200 nm
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* Vertical resolution ~ 300 nm
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* Piezo scanning range: 300 x 300 x 300 μm<sup>3</sup>
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* Stage scanning range: 100 x 100 mm<sup>2</sup>
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====Available Print Sets====
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{| class="wikitable" style="vertical-align:bottom;"
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|-
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! Objective
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! Voxel size (width)
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! Print field radius
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! Print time (per mm<sup>3</sup>)
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! Compatible Resins
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! Compatible Substrates
 +
|-
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| 63x
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| ~0.2 μm
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| 100 μm
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| ~2.5 hr
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| IP-Dip, IP-PDMS, IP-L
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| Fused Silica Glass, ITO/Soda Lime Glass, Silicon
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|-
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| 25x
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| ~0.6 μm
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| 200 μm
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| ~1.25 hr
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| IP-S, IP-PDMS, IP-L, IP-Visio
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| ITO/Soda Lime Glass, Silicon
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|-
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| 10x
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| ~1.2 μm
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| 500 μm
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| ~10 min
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| IP-Q, IP-PDMS
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| Silicon
 +
|}
 +
 +
'''Voxel =''' the smallest printable 3D volume, the 3D analogue of a 2D pixel. Single voxels are not mechanically stable. Multiple neighboring voxels/lines are recommended for stable structures.
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 +
'''Print field =''' the circular region an objective could write without moving the stage. Structures that exceed the print field of the objective must be split into blocks in Describe.
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'''Print time =''' how long to take to print a 10 μm cube (1 mm<sup>3</sup>). The print times for the 25x and 10x are calculated for shell recipes. Solid recipes would take longer to print the same volume.
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== Allowed Materials ==
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'''Other materials <u>must</u> have tool owner approval before use in this system!'''
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====Substrates====
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'''4" Wafers'''
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* Silicon, 500μm thickness
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'''25mm x 25mm'''
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* Silicon, 700μm or 500μm thickness
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* ITO-coated Soda Lime Glass - only if provided by Nanoscribe
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* Fused Silica Glass - only if provided by Nanoscribe
 +
 +
All substrates are available in the [https://nemo.nano.upenn.edu/stockroom/ QNF Stockroom]
 +
 +
====Resists====
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* IP-Dip
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* IP-S
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* IP-Q
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* IP-PDMS
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* IP-L
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* IP-Visio
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All resists are currently available as a QNF supplied materials and do not require separate purchase. More information about these resists can be found [[Resists_at_QNF#QNF_Supplied_Standard_Photoresists | here]]
 +
 +
== Training Protocol ==
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'''1.''' Remote session on EBL-02 for the Describe conversion software, using your structure (90min) <br>
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'''2.''' In-person session on LW-02 (120min) <br>
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'''3.''' Qualification session on LW-02, where you run the tool with minimal input (~60min) -- must be done after previous two sessions are completed, cannot be done the same day as the in-person training
 +
 +
''All should be requested through [https://nemo.nano.upenn.edu/training/ NEMO].''
  
 
== Resources ==
 
== Resources ==
 +
===== SOPs & Troubleshooting =====
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* [https://wiki.nano.upenn.edu/wiki/images/d/d4/LW-02_SOP.pdf QNF SOP]
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* [https://support.nanoscribe.com/hc/en-gb NanoGuide]
  
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===== SOPs & Troubleshooting =====
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===== Related Processing =====
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* [https://www.seas.upenn.edu/~nanosop/NanoScribe_3D_Printer.htm QNF SOP]
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* [[Soft Lithography]]
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* [[Photolithography]]
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===== References =====
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* [https://www.nanoscribe.com/en/products/photonic-professional-gt2/ Nanoscribe GT System]
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* [https://www.nanoscribe.com/en/products/ip-photoresins/ Nanoscribe IP Photoresins]

Latest revision as of 17:14, 7 November 2025


Nanoscribe Photonic Professional GT+
LW-02.jpeg
Tool Name Nanoscribe Photonic Professional GT+
Instrument Type Lithography
Staff Manager Ana Cohen
Lab Location Bay 6
Tool Manufacturer Nanoscribe
Tool Model Photonic Professional GT+
NEMO Designation LW-02
Nearest Phone XXXXX
SOP Link SOP

Description

The Nanoscribe Photonic Professional enables the fabrication of true 3D structures in the microscale via two-photon polymerization using a 780nm laser with ~100fs pulse, 80MHz repetition rate. This system allows for cutting-edge research and rapid prototyping in microfluidics, MEMS, microoptics, nanostructures and more.

Upgraded to GT+ in Dec 2024! Includes new housing with easier objective loading with 10x objective capability and greater print height (previously 3mm)

Tool Features

  • Laser Power: 50-150mW
  • Print Height: Up to 8mm
  • Lateral resolution ~ 200 nm
  • Vertical resolution ~ 300 nm
  • Piezo scanning range: 300 x 300 x 300 μm3
  • Stage scanning range: 100 x 100 mm2

Available Print Sets

Objective Voxel size (width) Print field radius Print time (per mm3) Compatible Resins Compatible Substrates
63x ~0.2 μm 100 μm ~2.5 hr IP-Dip, IP-PDMS, IP-L Fused Silica Glass, ITO/Soda Lime Glass, Silicon
25x ~0.6 μm 200 μm ~1.25 hr IP-S, IP-PDMS, IP-L, IP-Visio ITO/Soda Lime Glass, Silicon
10x ~1.2 μm 500 μm ~10 min IP-Q, IP-PDMS Silicon

Voxel = the smallest printable 3D volume, the 3D analogue of a 2D pixel. Single voxels are not mechanically stable. Multiple neighboring voxels/lines are recommended for stable structures.

Print field = the circular region an objective could write without moving the stage. Structures that exceed the print field of the objective must be split into blocks in Describe.

Print time = how long to take to print a 10 μm cube (1 mm3). The print times for the 25x and 10x are calculated for shell recipes. Solid recipes would take longer to print the same volume.

Allowed Materials

Other materials must have tool owner approval before use in this system!

Substrates

4" Wafers

  • Silicon, 500μm thickness

25mm x 25mm

  • Silicon, 700μm or 500μm thickness
  • ITO-coated Soda Lime Glass - only if provided by Nanoscribe
  • Fused Silica Glass - only if provided by Nanoscribe

All substrates are available in the QNF Stockroom

Resists

  • IP-Dip
  • IP-S
  • IP-Q
  • IP-PDMS
  • IP-L
  • IP-Visio

All resists are currently available as a QNF supplied materials and do not require separate purchase. More information about these resists can be found here

Training Protocol

1. Remote session on EBL-02 for the Describe conversion software, using your structure (90min)
2. In-person session on LW-02 (120min)
3. Qualification session on LW-02, where you run the tool with minimal input (~60min) -- must be done after previous two sessions are completed, cannot be done the same day as the in-person training

All should be requested through NEMO.

Resources

SOPs & Troubleshooting
Related Processing
References
Retrieved from "https://wiki.nano.upenn.edu/wiki/index.php?title=Nanoscribe_Photonic_Professional_GT&oldid=3004"