Difference between revisions of "Nanoscribe Photonic Professional GT"
| Line 30: | Line 30: | ||
* Stage scanning range: 100 x 100 mm2 | * Stage scanning range: 100 x 100 mm2 | ||
| − | == | + | {| class="wikitable" style="vertical-align:bottom;" |
| − | + | |- | |
| − | + | ! Objective | |
| − | + | ! Standard Resin | |
| − | + | ! Voxel size | |
| + | ! Print field (radius) | ||
| + | |- | ||
| + | | 63x | ||
| + | | IP-Dip2 | ||
| + | | ~0.2um | ||
| + | | 100um | ||
| + | |- | ||
| + | | 25x | ||
| + | | IP-S | ||
| + | | ~0.6um | ||
| + | | 200um | ||
| + | |- | ||
| + | | 10x | ||
| + | | IP-Q | ||
| + | | ~1.2um | ||
| + | | 500um | ||
| + | |} | ||
| + | |||
| + | '''Voxel =''' the smallest printable 3D volume, the 3D analogue of a 2D pixel. Single voxels are not mechanically stable. Multiple neighboring voxels/lines are recommended for stable structures. | ||
| + | |||
| + | '''Print field =''' the circular region an objective could write without moving the stage. Structures that exceed the print field of the objective must be split into blocks in Describe. | ||
== Allowed Materials == | == Allowed Materials == | ||
Revision as of 15:41, 7 November 2025
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| Tool Name | Nanoscribe Photonic Professional GT+ |
|---|---|
| Instrument Type | Lithography |
| Staff Manager | Ana Cohen |
| Lab Location | Bay 6 |
| Tool Manufacturer | Nanoscribe |
| Tool Model | Photonic Professional GT+ |
| NEMO Designation | LW-02 |
| Nearest Phone | XXXXX |
| SOP Link | SOP |
Description
The Nanoscribe Photonic Professional enables the fabrication of true 3D structures in the microscale via two-photon polymerization using a 780nm laser with ~100fs pulse, 80MHz repetition rate. This system allows for cutting-edge research and rapid prototyping in microfluidics, MEMS, microoptics, nanostructures and more.
Upgraded to GT+ in Dec 2024! Includes new housing with easier objective loading with 10x objective capability and greater print height (previously 3mm)
Key Features
- Laser Power: 50-150mW
- Print Height: Up to 8mm
- Lateral resolution ~ 200 nm
- Vertical resolution ~ 300 nm
- Piezo scanning range: 300 x 300 x 300 μm3
- Stage scanning range: 100 x 100 mm2
| Objective | Standard Resin | Voxel size | Print field (radius) |
|---|---|---|---|
| 63x | IP-Dip2 | ~0.2um | 100um |
| 25x | IP-S | ~0.6um | 200um |
| 10x | IP-Q | ~1.2um | 500um |
Voxel = the smallest printable 3D volume, the 3D analogue of a 2D pixel. Single voxels are not mechanically stable. Multiple neighboring voxels/lines are recommended for stable structures.
Print field = the circular region an objective could write without moving the stage. Structures that exceed the print field of the objective must be split into blocks in Describe.
Allowed Materials
Substrates
- 4" Si wafers (~500um thickness)
- Silicon pieces, 25mmx25mmx700um or 25mmx25mmx550um
- Nanoscribe ITO-coated Soda Lime, 25mmx25mmx700um -- available in the QNF Stockroom
- Nanoscribe Fused Silica, 25mmx25mmx700um -- available in the QNF Stockroom
Resists
Other materials must have tool owner approval before use!
Training Protocol
1. Remote session on EBL-02 for the Describe conversion software, using your structure (90min)
2. In-person session on LW-02 (120min)
3. Qualification session on LW-02, where you run the tool with minimal input (~60min) -- must be done after previous two sessions are completed, cannot be done the same day as the in-person training
All should be requested through NEMO.