Difference between revisions of "RTA-02"
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| name = AET Thermal RX | | name = AET Thermal RX | ||
| Tool_Name = Rapid Thermal Annealer - 02 | | Tool_Name = Rapid Thermal Annealer - 02 | ||
− | | image = [[Image:RTA02.jpg| | + | | image = [[Image:RTA02.jpg|200px]] |
| imagecaption = | | imagecaption = | ||
| Instrument_Type = Thermal Processing | | Instrument_Type = Thermal Processing |
Revision as of 15:40, 3 February 2025
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Tool Name | Rapid Thermal Annealer - 02 |
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Instrument Type | Thermal Processing |
Staff Manager | Lucas Barreto |
Lab Location | Bay 1 |
Tool Manufacturer | AET |
Tool Model | Thermal RX |
NEMO Designation | RTA-01 |
Lab Phone | 215-898-9736 |
SOP Link | {{{SOP Link}}} |
Description
The Rapid Thermal Annealer-02 anneals the sample up to 1200° C. The processes can be run under atmospheric pressure in Nitrogen, Forming Gas, and Argon environments. The tool can hold 4’’ wafers or smaller chips.
Resources
SOP