Difference between revisions of "IntlVac NanoQuest 1 IBE"

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| [[ Oxford PlasmaLab 100 PECVD | ''' SiO<sub>2<sub>''']] || 500 || 0 || 40  
 
| [[ Oxford PlasmaLab 100 PECVD | ''' SiO<sub>2<sub>''']] || 500 || 0 || 40  
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| [[ Cambridge Nanotech S200 ALD | ''' Al<sub>2<sub>O<sub>3<sub>''']] || 400 || 45 || 21
 
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Revision as of 09:01, 18 October 2024


IntlVac Nanoquest 1
[[]]
Tool Name IntlVac IBE
Instrument Type Etch
Staff Manager Sam Azadi
Lab Location Bay 2
Tool Manufacturer IntlVac
Tool Model Nanoquest 1
NEMO Designation DE-01
Lab Phone 215-898-9748
SOP Link SOP

Description

NanoQuest 1 is an ion miller connected to Ar gas and capable of etch small mm-scale samples up to full 4" wafers. The tool is equipped with a secondary ion mass spectroscopy (SIMS) unit and is capable of etch with manual endpoint detection. The stage has a tilt motor that allows for etch angles between 0 (directly facing the beam) and 90 degrees (parallel to the beam).

The tool in QNF is connected to Ar gas and can etch samples up to 4" wafer. Available beam voltages are: 300 V, 400 V, 450 V, and 500 V

Applications
  • Ion milling

Resources

manual loading/unloading operation video

Standard Process Information

Material Voltage [V] tilt [degree] Etch Rate [nm/min]
SiO2 300 0 15
SiO2 500 0 40
Al2O3 400 45 21

Process information from user community

Material Voltage [V] tilt [degree] Etch Rate [nm/min]
Al 400 45 60
Al 500 45 100
AlN 500 45 52
AlSc(.36)N 500 45 50
LiNbO3 500 0 40
Pt 500 45 20
SiO2 500 45 78
SOPs & Troubleshooting