Difference between revisions of "Micromanipulator 4060 Probe Station"
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| Line 8: | Line 8: | ||
| Instrument_Type = Electrical Characterization | | Instrument_Type = Electrical Characterization | ||
| Staff_Manager = [[Dan Sabrsula | Dan Sabrsula]] | | Staff_Manager = [[Dan Sabrsula | Dan Sabrsula]] | ||
| − | | Lab_Location = | + | | Lab_Location = Cleanroom Corridor |
| Tool_Manufacturer = Micromanipulator | | Tool_Manufacturer = Micromanipulator | ||
| − | | Tool_Model = Probe Station | + | | Tool_Model = 4060 Manual Probe Station |
| NEMO_Designation = MET-09 | | NEMO_Designation = MET-09 | ||
| Lab_Phone = XXXXX | | Lab_Phone = XXXXX | ||
| − | | SOP Link = [ | + | | SOP Link = [https://upenn.box.com/s/ukeyl065gn4xsn9pflmjjw2p2omghlo6 SOP] |
}} | }} | ||
== Description == | == Description == | ||
| − | The system allows probing of wafers, | + | The system allows probing of wafers, MOSFETs, or samples of widely varying dimensions. The probe station is set up for use with up to two Keithley 2450 Source Measure Units (SMU) across four articulated probe heads. Each probe head uses a Tungsten probe tip with a 500nm tip radius to make contact with the device under test. The probe station is capable of performing a wide variety of measurements including: 2-point and 4-point resistivity measurements, time dependent I-V characterization, and other highly customizable tests. |
===== Applications ===== | ===== Applications ===== | ||
| − | * Material resistivity measurements | + | * Material resistivity measurements |
| − | + | * I-V characterization | |
| − | + | * Gate/Drain measurements | |
== Resources == | == Resources == | ||
===== SOPs & Troubleshooting ===== | ===== SOPs & Troubleshooting ===== | ||
| − | * [ | + | * [https://nemo.nano.upenn.edu/media/tool_documents/met-09-probe-station/MET-09_SOP.pdf SOP] |
Latest revision as of 15:31, 17 September 2024
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| Tool Name | Micromanipulator 4060 Probe Station |
|---|---|
| Instrument Type | Electrical Characterization |
| Staff Manager | Dan Sabrsula |
| Lab Location | Cleanroom Corridor |
| Tool Manufacturer | Micromanipulator |
| Tool Model | 4060 Manual Probe Station |
| NEMO Designation | MET-09 |
| Lab Phone | XXXXX |
| SOP Link | SOP |
Description
The system allows probing of wafers, MOSFETs, or samples of widely varying dimensions. The probe station is set up for use with up to two Keithley 2450 Source Measure Units (SMU) across four articulated probe heads. Each probe head uses a Tungsten probe tip with a 500nm tip radius to make contact with the device under test. The probe station is capable of performing a wide variety of measurements including: 2-point and 4-point resistivity measurements, time dependent I-V characterization, and other highly customizable tests.
Applications
- Material resistivity measurements
- I-V characterization
- Gate/Drain measurements