Difference between revisions of "Micromanipulator 4060 Probe Station"

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(Created page with "Category:Electrical Characterization {{EquipmentInfo | name = Micromanipulator 4060 Probe Station | Tool_Name = Micromanipulator 4060 Probe Station | image = Image:MET-...")
 
 
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| Instrument_Type = Electrical Characterization
 
| Instrument_Type = Electrical Characterization
 
| Staff_Manager = [[Dan Sabrsula | Dan Sabrsula]]
 
| Staff_Manager = [[Dan Sabrsula | Dan Sabrsula]]
| Lab_Location = Bay 2
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| Lab_Location = Cleanroom Corridor
 
| Tool_Manufacturer = Micromanipulator
 
| Tool_Manufacturer = Micromanipulator
| Tool_Model = Probe Station
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| Tool_Model = 4060 Manual Probe Station
 
| NEMO_Designation = MET-09
 
| NEMO_Designation = MET-09
 
| Lab_Phone = XXXXX
 
| Lab_Phone = XXXXX
| SOP Link = [ NA]
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| SOP Link = [https://upenn.box.com/s/ukeyl065gn4xsn9pflmjjw2p2omghlo6 SOP]
 
}}
 
}}
  
 
== Description ==
 
== Description ==
The system allows probing of wafers, ingots, or samples of widely varying dimensions. A locking mechanism allows the arm to be moved up and down the steel pole and locked to suit any sample height. A plug attached to the arm prevents the wiring from getting entangled with samples, fingers etc. The system utilizes a Jandel Cylindrical probe head.
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The system allows probing of wafers, MOSFETs, or samples of widely varying dimensions. The probe station is set up for use with up to two Keithley 2450 Source Measure Units (SMU) across four articulated probe heads. Each probe head uses a Tungsten probe tip with a 500nm tip radius to make contact with the device under test. The probe station is capable of performing a wide variety of measurements including: 2-point and 4-point resistivity measurements, time dependent I-V characterization, and other highly customizable tests.  
  
 
===== Applications =====
 
===== Applications =====
* Material resistivity measurements  
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* Material resistivity measurements
 
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* I-V characterization
 
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* Gate/Drain measurements
  
 
== Resources ==
 
== Resources ==
  
 
===== SOPs & Troubleshooting =====
 
===== SOPs & Troubleshooting =====
* [NA - staff assisted use only]
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* [https://nemo.nano.upenn.edu/media/tool_documents/met-09-probe-station/MET-09_SOP.pdf SOP]

Latest revision as of 15:31, 17 September 2024


Micromanipulator 4060 Probe Station
MET-09.jpeg
Tool Name Micromanipulator 4060 Probe Station
Instrument Type Electrical Characterization
Staff Manager Dan Sabrsula
Lab Location Cleanroom Corridor
Tool Manufacturer Micromanipulator
Tool Model 4060 Manual Probe Station
NEMO Designation MET-09
Lab Phone XXXXX
SOP Link SOP

Description

The system allows probing of wafers, MOSFETs, or samples of widely varying dimensions. The probe station is set up for use with up to two Keithley 2450 Source Measure Units (SMU) across four articulated probe heads. Each probe head uses a Tungsten probe tip with a 500nm tip radius to make contact with the device under test. The probe station is capable of performing a wide variety of measurements including: 2-point and 4-point resistivity measurements, time dependent I-V characterization, and other highly customizable tests.

Applications
  • Material resistivity measurements
  • I-V characterization
  • Gate/Drain measurements

Resources

SOPs & Troubleshooting