Difference between revisions of "Process Resources"
Jump to navigation
Jump to search
| (One intermediate revision by the same user not shown) | |||
| Line 4: | Line 4: | ||
= Lithography = | = Lithography = | ||
* [[Resists at QNF]] | * [[Resists at QNF]] | ||
| − | * [[Developers at QNF]] -- Under Construction | + | * [[Developers at QNF]] -- Under Construction |
* [[Ancillary Process Chemicals at QNF]] -- Under Construction | * [[Ancillary Process Chemicals at QNF]] -- Under Construction | ||
| − | * [ | + | * [[How to Make a Mask]] -- Under Construction |
= Film Characterization= | = Film Characterization= | ||
Latest revision as of 14:48, 17 June 2024
General Process Documents
Lithography
- Resists at QNF
- Developers at QNF -- Under Construction
- Ancillary Process Chemicals at QNF -- Under Construction
- How to Make a Mask -- Under Construction
Film Characterization
- Deposition and Etch Characterization of LPCVD SiNx thin films
- ALD deposition of SiO2 using BDEAS and Ozone precursors