Difference between revisions of "Elionix ELS-7500EX E-Beam Lithography System"
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(Created page with "Category:Lithography {{EquipmentInfo | name = Elionix ELS-7500EX E-Beam Lithography System | Tool_Name = Elionix ELS-7500EX E-Beam Lithography System | image = Image:EB...") |
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===== SOPs & Troubleshooting ===== | ===== SOPs & Troubleshooting ===== | ||
* [https://repository.upenn.edu/scn_sop/21/ SOP] | * [https://repository.upenn.edu/scn_sop/21/ SOP] | ||
| + | |||
| + | ===== Resist and Process Data ===== | ||
| + | |||
| + | * [https://repository.upenn.edu/scn_protocols/34/ PMMA A2 and A4 Spin Curves] | ||
| + | * [https://repository.upenn.edu/scn_protocols/35/ PMMA A2 Contrast Curves] | ||
| + | * [https://repository.upenn.edu/scn_protocols/49/ CSAR-62 Contrast Curves] | ||
| + | * [https://repository.upenn.edu/scn_protocols/33/ ZEP Contrast Curves] | ||
| + | * [https://repository.upenn.edu/scn_protocols/50/ DisCharge Spin-on Anticharging Agent] | ||
| + | * [https://avs.scitation.org/doi/full/10.1116/1.2366698 Cold Development for PMMA and ZEP] | ||
| + | * [https://www.sciencedirect.com/science/article/pii/S0167931702004689 IPA:H<sub>2</sub>O for High Contrast Development of PMMA] | ||
Revision as of 12:36, 18 March 2022
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| Tool Name | Elionix ELS-7500EX E-Beam Lithography System |
|---|---|
| Instrument Type | Lithography |
| Staff Manager | David Barth |
| Lab Location | Bay 4 |
| Tool Manufacturer | Elionix |
| Tool Model | ELS-7500EX |
| NEMO Designation | {{{NEMO_Designation}}} |
| Nearest Phone | 8-9799 |
| SOP Link | SOP |
Description
The Elionix ELS-7500EX is an electron beam lithography tool capable of high resolution patterning at 50 kV with currents from 10 pA to 20 nA.
Applications
- Patterning of positive and negative e-beam resists with features from ~10 nm to micron scale
Allowed Materials
- Standard semiconductor materials
- Low vapor pressure metals
- Resists