Difference between revisions of "Micromanipulator 4060 Probe Station"
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(Created page with "Category:Electrical Characterization {{EquipmentInfo | name = Micromanipulator 4060 Probe Station | Tool_Name = Micromanipulator 4060 Probe Station | image = Image:MET-...") |
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== Description == | == Description == | ||
| − | The system allows probing of wafers, ingots, or samples of widely varying dimensions. | + | The system allows probing of wafers, ingots, or samples of widely varying dimensions. The probe station is set up for use with up to two Keithley 2450 Source Measure Units (SMU) across four articulated probe heads. Each probe head uses a Tungsten probe tip with a 500nm tip radius to make contact with the device under test. The probe station is capable of performing 2-point and 4-point resistivity measurements, time dependent I-V characterization, |
===== Applications ===== | ===== Applications ===== | ||
Revision as of 10:11, 26 April 2024
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| Tool Name | Micromanipulator 4060 Probe Station |
|---|---|
| Instrument Type | Electrical Characterization |
| Staff Manager | Dan Sabrsula |
| Lab Location | Bay 2 |
| Tool Manufacturer | Micromanipulator |
| Tool Model | Probe Station |
| NEMO Designation | MET-09 |
| Lab Phone | XXXXX |
| SOP Link | [ NA] |
Description
The system allows probing of wafers, ingots, or samples of widely varying dimensions. The probe station is set up for use with up to two Keithley 2450 Source Measure Units (SMU) across four articulated probe heads. Each probe head uses a Tungsten probe tip with a 500nm tip radius to make contact with the device under test. The probe station is capable of performing 2-point and 4-point resistivity measurements, time dependent I-V characterization,
Applications
- Material resistivity measurements
Resources
SOPs & Troubleshooting
- [NA - staff assisted use only]