Difference between revisions of "Process Resources"
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| Line 6: | Line 6: | ||
* [[Developers at QNF]] -- Under Construction] | * [[Developers at QNF]] -- Under Construction] | ||
* [[Ancillary Process Chemicals at QNF]] -- Under Construction | * [[Ancillary Process Chemicals at QNF]] -- Under Construction | ||
| − | * [ | + | * [https://nemo.nano.upenn.edu/media/tool_documents/lw-01-heidelberg-dwl66/How_to_Make_a_Mask_At_QNF_v04.pdf How to Make a Mask] |
= Film Characterization= | = Film Characterization= | ||
Revision as of 15:30, 17 June 2024
General Process Documents
Lithography
- Resists at QNF
- Developers at QNF -- Under Construction]
- Ancillary Process Chemicals at QNF -- Under Construction
- How to Make a Mask
Film Characterization
- Deposition and Etch Characterization of LPCVD SiNx thin films
- ALD deposition of SiO2 using BDEAS and Ozone precursors