View source for Micromanipulator 4060 Probe Station

[[Category:Electrical Characterization]]

{{EquipmentInfo
| name = Micromanipulator 4060 Probe Station
| Tool_Name = Micromanipulator 4060 Probe Station
| image = [[Image:MET-09.jpeg|300px]]
| imagecaption = 
| Instrument_Type = Electrical Characterization
| Staff_Manager = [[Dan Sabrsula | Dan Sabrsula]]
| Lab_Location = Cleanroom Corridor
| Tool_Manufacturer = Micromanipulator
| Tool_Model = 4060 Manual Probe Station
| NEMO_Designation = MET-09
| Lab_Phone = XXXXX
| SOP Link = [https://upenn.box.com/s/ukeyl065gn4xsn9pflmjjw2p2omghlo6 SOP]
}}

== Description ==
The system allows probing of wafers, MOSFETs, or samples of widely varying dimensions. The probe station is set up for use with up to two Keithley 2450 Source Measure Units (SMU) across four articulated probe heads. Each probe head uses a Tungsten probe tip with a 500nm tip radius to make contact with the device under test. The probe station is capable of performing a wide variety of measurements including: 2-point and 4-point resistivity measurements, time dependent I-V characterization, and other highly customizable tests. 

===== Applications =====
* Material resistivity measurements
* I-V characterization
* Gate/Drain measurements

== Resources ==

===== SOPs & Troubleshooting =====
* [https://nemo.nano.upenn.edu/media/tool_documents/met-09-probe-station/MET-09_SOP.pdf SOP]