View source for Intlvac E-beam Evaporator

[[Category:Deposition]]

{{EquipmentInfo
| name = Intlvac E-Beam Evaporator
| Tool_Name = Intlvac E-Beam Evaporator
| image = [[Image:PVD-09.jpg|300px]]
| imagecaption = 
| Instrument_Type = Physical vapor deposition
| Staff_Manager = [[David Barth | David Barth]]
| Lab_Location = Bay 2
| Tool_Manufacturer = Intlvac
| Tool_Model = Nanochrome
| NEMO_Designation = PVD-09
| Lab_Phone = 215-898-9748
| SOP Link = [https://nemo.nano.upenn.edu/media/tool_documents/pvd-09-intlvac-evap/PVD09_SOP_v01.docx.pdf SOP]
}}

== Description ==
===== The tool =====

The IntlVac Electron Beam Evaporator has a base process chamber pressure in the low e-8 Torr range with substrate heating and ozone purging capabilities. Deposition rates are monitored by an automated magazine of 6MHz crystals. The tool can be used to process a single 4 inch wafer at a time or a selection of small chips/pieces.

===== Available materials =====
The tool contains the following materials:

* Al - Aluminum
* Ti - Titanium

== Resources ==

===== SOPs & Troubleshooting =====

* [https://nemo.nano.upenn.edu/media/tool_documents/pvd-09-intlvac-evap/PVD09_SOP_v01.docx.pdf PVD-09 SOP]