View source for Elionix ELS-7500EX E-Beam Lithography System

[[Category:Lithography]]

{{EquipmentInfo
| name = Elionix ELS-7500EX E-Beam Lithography System
| Tool_Name = Elionix ELS-7500EX E-Beam Lithography System
| image = [[Image:EBL-01.jpeg|300px]]
| imagecaption = 
| Instrument_Type = Lithography
| Staff_Manager = David Barth
| Lab_Location = Bay 4
| Tool_Manufacturer = Elionix
| Tool_Model = ELS-7500EX
| Iris_Designation = EBL-01
| Lab_Phone = 8-9799
| SOP Link = [https://repository.upenn.edu/scn_sop/21/ SOP]
}}

== Description ==
The Elionix ELS-7500EX is an electron beam lithography tool capable of high resolution patterning at 50 kV with currents from 10 pA to 20 nA.

===== Applications =====
* Patterning of positive and negative e-beam resists with features from ~10 nm to micron scale

===== Allowed Materials =====
* Standard semiconductor materials
* Low vapor pressure metals
* Resists 

== Resources ==

===== SOPs & Troubleshooting =====
* [https://repository.upenn.edu/scn_sop/21/ SOP]