Difference between revisions of "QNF Equipment Owner Matrix"

From Quattrone Nanofabrication Facility
Jump to navigation Jump to search
Line 20: Line 20:
 
| Ultratech Fiji G2 ALD || ALD-02 || Deposition || Faculty Managed
 
| Ultratech Fiji G2 ALD || ALD-02 || Deposition || Faculty Managed
 
|-
 
|-
−
| Veeco Savannah 200 || ALD-03 || Deposition || Sam
+
| Veeco Savannah 200 || ALD-03 || Deposition || [[Sam Azadi | Sam]]
 
|-
 
|-
−
| Oxford PlasmaLab 100 PECVD || CVD-01 || Deposition || Sam
+
| Oxford PlasmaLab 100 PECVD || CVD-01 || Deposition || [[Sam Azadi | Sam]]
 
|-
 
|-
−
| MRL Wet/Dry Thermal Oxide || CVD-02 A || Deposition || Sam
+
| MRL Wet/Dry Thermal Oxide || CVD-02 A || Deposition || [[Sam Azadi | Sam]]
 
|-
 
|-
−
| MRL LPCVD Silicon Nitride || CVD-02 B || Deposition || Sam
+
| MRL LPCVD Silicon Nitride || CVD-02 B || Deposition || [[Sam Azadi | Sam]]
 
|-
 
|-
−
| MRL Anneal 1 || CVD-02 C || Deposition || Sam
+
| MRL Anneal 1 || CVD-02 C || Deposition || [[Sam Azadi | Sam]]
 
|-
 
|-
−
| MRL Anneal 2 || CVD-02 D || Deposition || Sam
+
| MRL Anneal 2 || CVD-02 D || Deposition || [[Sam Azadi | Sam]]
 
|-
 
|-
 
| SMI MOCVD, Horizontal Reactor || CVD-04 H || Deposition || Faculty Managed
 
| SMI MOCVD, Horizontal Reactor || CVD-04 H || Deposition || Faculty Managed
Line 44: Line 44:
 
| Lesker PVD75 E-beam Evaporator || PVD-04 || Deposition || [[David_Jones | David J]]
 
| Lesker PVD75 E-beam Evaporator || PVD-04 || Deposition || [[David_Jones | David J]]
 
|-
 
|-
−
| Denton Explorer14 Magnetron Sputterer || PVD-05 || Deposition || Sam
+
| Denton Explorer14 Magnetron Sputterer || PVD-05 || Deposition || [[Sam Azadi | Sam]]
 
|-
 
|-
 
| Evatec Clusterline 200 II || PVD-06 || Deposition || Faculty Managed
 
| Evatec Clusterline 200 II || PVD-06 || Deposition || Faculty Managed
 
|-
 
|-
−
| Anatech SCE-108 Barrel Asher || DE-02 || Dry Etch || Sam
+
| Anatech SCE-108 Barrel Asher || DE-02 || Dry Etch || [[Sam Azadi | Sam]]
 
|-
 
|-
−
| SPTS Si DRIE || DE-03 || Dry Etch || Sam
+
| SPTS Si DRIE || DE-03 || Dry Etch || [[Sam Azadi | Sam]]
 
|-
 
|-
−
| Oxford 80 Plus RIE || DE-04 || Dry Etch || Sam
+
| Oxford 80 Plus RIE || DE-04 || Dry Etch || [[Sam Azadi | Sam]]
 
|-
 
|-
−
| Oxford Cobra ICP Etcher || DE-05 || Dry Etch || Sam
+
| Oxford Cobra ICP Etcher || DE-05 || Dry Etch || [[Sam Azadi | Sam]]
 
|-
 
|-
−
| SPTS/Xactix XeF2 Isotropic Etcher || DE-06 || Dry Etch || Sam
+
| SPTS/Xactix XeF2 Isotropic Etcher || DE-06 || Dry Etch || [[Sam Azadi | Sam]]
 
|-
 
|-
−
| Jupiter II RIE Plasma Etcher || DE-08 || Dry Etch || Sam
+
| Jupiter II RIE Plasma Etcher || DE-08 || Dry Etch || [[Sam Azadi | Sam]]
 
|-
 
|-
 
| Zeiss Smartzoom5 2D/3D Optical Microscope || MET-10 || Inspection || [[Eric_Johnston | Eric]]
 
| Zeiss Smartzoom5 2D/3D Optical Microscope || MET-10 || Inspection || [[Eric_Johnston | Eric]]
Line 90: Line 90:
 
| SUSS MicroTec AS8 AltaSpray || RC-01 || Lithography || [[David_Jones | David J]]
 
| SUSS MicroTec AS8 AltaSpray || RC-01 || Lithography || [[David_Jones | David J]]
 
|-
 
|-
−
| KLA Tencor P7 2D profilometer || MET-01 || Metrology || Sam
+
| KLA Tencor P7 2D profilometer || MET-01 || Metrology || [[Sam Azadi | Sam]]
 
|-
 
|-
−
| KLA Tencor P7 2D&3D/stress profilometer || MET-02 || Metrology || Sam
+
| KLA Tencor P7 2D&3D/stress profilometer || MET-02 || Metrology || [[Sam Azadi | Sam]]
 
|-
 
|-
−
| Filmetrics F50 (yellow light) || MET-03 || Metrology || Sam
+
| Filmetrics F50 (yellow light) || MET-03 || Metrology || [[Sam Azadi | Sam]]
 
|-
 
|-
−
| Filmetrics F40 || MET-04 || Metrology || Sam
+
| Filmetrics F40 || MET-04 || Metrology || [[Sam Azadi | Sam]]
 
|-
 
|-
 
| Zygo NewView 7300 Optical Profilometer || MET-05 || Metrology || [[David_Barth | David B]]
 
| Zygo NewView 7300 Optical Profilometer || MET-05 || Metrology || [[David_Barth | David B]]
Line 102: Line 102:
 
| Woollam VAS Ellipsometer || MET-06 || Metrology || [[Eric_Johnston | Eric]]
 
| Woollam VAS Ellipsometer || MET-06 || Metrology || [[Eric_Johnston | Eric]]
 
|-
 
|-
−
| Jandel Multi Height Four Point Probe || MET-08 || Metrology || Sam
+
| Jandel Multi Height Four Point Probe || MET-08 || Metrology || [[Sam Azadi | Sam]]
 
|-
 
|-
 
| Micromanipulator 4060 Probe Station || MET-09 || Metrology || TBA
 
| Micromanipulator 4060 Probe Station || MET-09 || Metrology || TBA
 
|-
 
|-
−
| Filmetrics F50 (white light) || MET-11 || Metrology || Sam
+
| Filmetrics F50 (white light) || MET-11 || Metrology || [[Sam Azadi | Sam]]
 
|-
 
|-
−
| Anatech SCE-106 Barrel Asher || DE-07 || Soft Lithography || Sam
+
| Anatech SCE-106 Barrel Asher || DE-07 || Soft Lithography || [[Sam Azadi | Sam]]
 
|-
 
|-
 
| ABM3000HR Mask Aligner || MA-03 || Soft Lithography || [[Eric_Johnston | Eric]]
 
| ABM3000HR Mask Aligner || MA-03 || Soft Lithography || [[Eric_Johnston | Eric]]

Revision as of 16:34, 18 March 2022

Tool Name Tool ID Tool Group Process Owner
EVG 510 Wafer Bonder BE-01 Backend Eric
EVG 620 Wafer Bond Aligner BE-02 Backend Eric
K&S Wire Bonder BE-03 Backend Eric
ADT 7100 Dicing Saw BE-04 Backend David J
MPT Corp. RTP-600S Rapid Thermal Annealer BE-05 Backend David B
Tousimis Critical Point Dryer CPD-01 Backend David J
Dimatix ink-Jet Printer INK-01 Backend TBA
Cambridge Nanotech S200 ALD ALD-01 Deposition Sam
Ultratech Fiji G2 ALD ALD-02 Deposition Faculty Managed
Veeco Savannah 200 ALD-03 Deposition Sam
Oxford PlasmaLab 100 PECVD CVD-01 Deposition Sam
MRL Wet/Dry Thermal Oxide CVD-02 A Deposition Sam
MRL LPCVD Silicon Nitride CVD-02 B Deposition Sam
MRL Anneal 1 CVD-02 C Deposition Sam
MRL Anneal 2 CVD-02 D Deposition Sam
SMI MOCVD, Horizontal Reactor CVD-04 H Deposition Faculty Managed
SMI MOCVD, Vertical Reactor CVD-04 V Deposition Faculty Managed
Lesker Nano-36 Thermal Evaporator PVD-01 Deposition David B
Lesker PVD75 E-Beam/Thermal Evaporator PVD-02 Deposition David B
Lesker PVD75 DC/RF Sputterer PVD-03 Deposition David J
Lesker PVD75 E-beam Evaporator PVD-04 Deposition David J
Denton Explorer14 Magnetron Sputterer PVD-05 Deposition Sam
Evatec Clusterline 200 II PVD-06 Deposition Faculty Managed
Anatech SCE-108 Barrel Asher DE-02 Dry Etch Sam
SPTS Si DRIE DE-03 Dry Etch Sam
Oxford 80 Plus RIE DE-04 Dry Etch Sam
Oxford Cobra ICP Etcher DE-05 Dry Etch Sam
SPTS/Xactix XeF2 Isotropic Etcher DE-06 Dry Etch Sam
Jupiter II RIE Plasma Etcher DE-08 Dry Etch Sam
Zeiss Smartzoom5 2D/3D Optical Microscope MET-10 Inspection Eric
Zeiss Axio Imager M2m Microscope (1 of 4) MET-12 Inspection David J
Zeiss Axio Imager M2m Microscope (2 of 4) MET-13 Inspection David J
Zeiss Axio Imager M2m Microscope (3 of 4) MET-14 Inspection David J
Zeiss Axio Imager M2m Microscope (4 of 4) MET-15 Inspection David J
IPG IX-255 Excimer Laser Micromachining LMM-01 Laser Micromachining Eric
IPG IX280-DXF Green Laser Micromachining LMM-02 Laser Micromachining Eric
Elionix ELS-7500EX E-Beam Lithography System EBL-01 Lithography David B
Litho Workstation for BEAMER and TRACER EBL-02 Lithography David B
Heidelberg DWL 66+ Laser Writer LW-01 Lithography David J
Nanoscribe Photonic Professional GT LW-02 Lithography David J
SUSS MicroTec MA6 Gen3 Mask Aligner MA-01 Lithography David J
Nanonex NX2600 Nanoimprint/Mask Aligner MA-02 Lithography David B
Hawks/Genesis HMDS Vapor Prime Oven OVN-01 Lithography David J
SUSS MicroTec AS8 AltaSpray RC-01 Lithography David J
KLA Tencor P7 2D profilometer MET-01 Metrology Sam
KLA Tencor P7 2D&3D/stress profilometer MET-02 Metrology Sam
Filmetrics F50 (yellow light) MET-03 Metrology Sam
Filmetrics F40 MET-04 Metrology Sam
Zygo NewView 7300 Optical Profilometer MET-05 Metrology David B
Woollam VAS Ellipsometer MET-06 Metrology Eric
Jandel Multi Height Four Point Probe MET-08 Metrology Sam
Micromanipulator 4060 Probe Station MET-09 Metrology TBA
Filmetrics F50 (white light) MET-11 Metrology Sam
Anatech SCE-106 Barrel Asher DE-07 Soft Lithography Sam
ABM3000HR Mask Aligner MA-03 Soft Lithography Eric
SCS PDS2010 Parylene Coater PVD-07 Soft Lithography Kyle
Silanization Dessicator PVD-08 Soft Lithography Eric
Spinner - SU-8/PDMS SPN-07 Soft Lithography Eric
Spinner - Positive Resist (Left) - 4" Wafer Only SPN-01 Spinners David J
Spinner - Positive Resist (Right) - Small Piece Only SPN-03 Spinners David J
Spinner - Negative Resist (Left) SPN-04 Spinners David J
Spinner - Negative Resist (Right) SPN-05 Spinners David J
Spinner - E-Beam Resist Only SPN-06 Spinners David J
Spin Rinse Dryer SRD-01 Wet Bench Kyle
Hydrofluoric (HF) Acid Process WB-06 Wet Bench Eric
Retrieved from "https://wiki.nano.upenn.edu/wiki/index.php?title=QNF_Equipment_Owner_Matrix&oldid=197"