Difference between revisions of "Oxford 80 Plus RIE"
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| Line 7: | Line 7: | ||
| imagecaption = | | imagecaption = | ||
| Instrument_Type = Etch | | Instrument_Type = Etch | ||
| − | | Staff_Manager = Sam Azadi | + | | Staff_Manager = [[Sam Azadi | Sam Azadi]] |
| Lab_Location = Bay 2 | | Lab_Location = Bay 2 | ||
| Tool_Manufacturer = Oxford Instruments | | Tool_Manufacturer = Oxford Instruments | ||
| Tool_Model = 80+ | | Tool_Model = 80+ | ||
| − | | | + | | NEMO_Designation = DE-04 |
| Lab_Phone = 215-898-9748 | | Lab_Phone = 215-898-9748 | ||
| SOP Link = [https://repository.upenn.edu/scn_sop/7/ QNF SOP] | | SOP Link = [https://repository.upenn.edu/scn_sop/7/ QNF SOP] | ||
| Line 29: | Line 29: | ||
===== The following materials are not allowed in the chamber ===== | ===== The following materials are not allowed in the chamber ===== | ||
| − | - Au, Ag, PZT, ZnO, ITO, Pb, Zn, In | + | - Au, Ag, PZT, ZnO, ITO, Pb, Zn, In, Ni |
===== The following materials can not be exposed to plasma in the chamber ===== | ===== The following materials can not be exposed to plasma in the chamber ===== | ||
| Line 37: | Line 37: | ||
===== Protocols and Reports ===== | ===== Protocols and Reports ===== | ||
| − | + | Process parameters and characterization of etching of ... | |
| − | * [https://repository.upenn.edu/scn_tooldata/36/ | + | * [https://repository.upenn.edu/scn_tooldata/36/ '''PECVD SiO<sub>2</sub> via CF<sub>4</sub>''' ] |
| − | * [https://repository.upenn.edu/scn_tooldata/37/ | + | * [https://repository.upenn.edu/scn_tooldata/37/ '''PECVD SiN<sub>x</sub> via CF<sub>4</sub>'''] |
| − | * [https://repository.upenn.edu/scn_tooldata/38/ | + | * [https://repository.upenn.edu/scn_tooldata/38/ '''PECVD SiO<sub>2</sub> via CHF<sub>3</sub> + O <sub>2</sub>'''] |
| − | * [https://repository.upenn.edu/scn_tooldata/39/ | + | * [https://repository.upenn.edu/scn_tooldata/39/ '''PECVD SiN<sub>x</sub> via CHF<sub>3</sub> + O <sub>2</sub>'''] |
| − | * [https://repository.upenn.edu/scn_protocols/29/ | + | * [https://repository.upenn.edu/scn_protocols/29/ '''PECVD SiO<sub>2</sub> via CHF<sub>3</sub> + O <sub>2</sub>'''] |
| − | * [https://repository.upenn.edu/scn_tooldata/40/ | + | * [https://repository.upenn.edu/scn_tooldata/40/ '''Si and ZEP520A resist via CF<sub>4</sub>'''] |
| + | |||
| + | * [https://repository.upenn.edu/scn_protocols/55/ ''' Comparison of Si and PECVD SiO<sub>2</sub> via CF<sub>4</sub> and CHF<sub>3</sub> + O <sub>2</sub>'''] | ||
==== Etch Rate ==== | ==== Etch Rate ==== | ||
| − | Recipe parameters are defined in the reports above. | + | Recipe parameters are defined in the reports above. - all rates are calculated from a full 4" wafers, small features may have lower etch rate. |
| − | + | Etch rate of... | |
| − | * | + | * '''PECVD oxide and nitride''' are listed in the ''reports above''. |
| − | * | + | * '''thermal SiO2''' using '''CF4 recipe''': ''48 nm/min'' |
| − | * | + | * '''thermal SiO2''' using '''CHF3/O2 recipe''': ''45 nm/min'' |
| − | * | + | * '''LPCVD SiNx''' using '''CF4 recipe''': ''55 nm/min'', DV bias 440 V - measured on 03/05/2024 |
| − | * | + | * '''LPCVD SiNx''' using '''CHF3/O2 recipe''': ''45 nm/min'', DC bias 410 V - measured on 03/05/2024 |
== Resources == | == Resources == | ||
Latest revision as of 14:54, 5 March 2024
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|
| Tool Name | Oxford 80 Plus RIE |
|---|---|
| Instrument Type | Etch |
| Staff Manager | Sam Azadi |
| Lab Location | Bay 2 |
| Tool Manufacturer | Oxford Instruments |
| Tool Model | 80+ |
| NEMO Designation | DE-04 |
| Lab Phone | 215-898-9748 |
| SOP Link | QNF SOP |
Description
Oxford 80 Plus is an anisotropic dry etch tool. The main use of this tool is to etch SiO2, and SiNx to create hard masks for deep Si etch. However, it etches many other materials, including a variety of resists. The tool is connected to the following gases: Ar, O2, CF4, CHF3, SF6.
The plasma is ignited by the oscillating electric field created by the RF power at 13.56 MHz. The wafer is cooled down via passive cooling through a graphite chuck.
Applications
- Etch of SiO2
- Etch of SiNx
- Etch of Si
- Etch of resist
The following materials are not allowed in the chamber
- Au, Ag, PZT, ZnO, ITO, Pb, Zn, In, Ni
The following materials can not be exposed to plasma in the chamber
- SU-8, Cyclone, Polyimide
Standard Process Information
Protocols and Reports
Process parameters and characterization of etching of ...
Etch Rate
Recipe parameters are defined in the reports above. - all rates are calculated from a full 4" wafers, small features may have lower etch rate.
Etch rate of...
- PECVD oxide and nitride are listed in the reports above.
- thermal SiO2 using CF4 recipe: 48 nm/min
- thermal SiO2 using CHF3/O2 recipe: 45 nm/min
- LPCVD SiNx using CF4 recipe: 55 nm/min, DV bias 440 V - measured on 03/05/2024
- LPCVD SiNx using CHF3/O2 recipe: 45 nm/min, DC bias 410 V - measured on 03/05/2024