Difference between revisions of "Mo master recipe"

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> [[Denton_Explorer14_Magnetron_Sputterer | Click here to return to PVD-05]]  <
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> [[Denton_Explorer14_Magnetron_Sputterer#Process_data_&_master_recipes | Click here to return to PVD-05]]  <
  
 
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Latest revision as of 15:02, 30 January 2023

> Click here to return to PVD-05 <

Step Number T000 T001 T002 T003 T004 T005 T006
Step Time (sec) - - - - - - -
Min Vacuum Setpoint (Torr) - - - - - - -
Gas - (PID or Fixed) - - - - - - -
Gas - PID Master Gas Select - - - - - - -
Gas1 - Setpoint (sccm) - - - - - - -
Gas2 - Setpoint (sccm) - - - - - - -
Gas PID Pressure (mTorr) - - - - - - -
RF Source - Sputter (Watts) - - - - - - -
RF Source - Cathode Select - - - - - - -
RF Source - Shutter - - - - - - -
DC 1 Source - Sputter (Watts) - - - - - - -
DC 1 Source - Cathode Select - - - - - - -
DC 1 Source - Shutter - - - - - - -
DC 2 Source - Sputter (Watts) - - - - - - -
DC 2 Source - Shutter - - - - - - -
Pressure Control (Throttle) - - - - - - -
Ignition Pressure (mTorr) - - - - - - -
Rotation Speed (0-100%) - - - - - - -
End Process (Yes) - - - - - - -